Published online by Cambridge University Press: 25 February 2011
Hydrogenated amorphous carbon (a-C:H) films have been deposited by sputter assisted plasma chemical vapor deposition (CVD). The relative concentration of sp3 and sp2 hybridized carbon in samples is determined by infrared (IR) and nuclear magnetic resonance (NMR) spectroscopies and by a new method through the complex dielectric constant deduced from optical transmittance and reflectance. The results are compared and discussed.