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Characterization of the Ni/NiO, Interface Region in Oxidized High Purity Nickel by Transmission Electron Microscopy

Published online by Cambridge University Press:  22 February 2011

Howard T. Sawhill  and
Linn W. Hobbs
Howard T. Sawhill
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology Cambridge, MA 02139, USA
Linn W. Hobbs
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology Cambridge, MA 02139, USA
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Abstract

Ni/NiO interface structures were investigated using TEM, and the observed structures were compared with current heterophase interface models. Relative magnitudes of Ni/NiO interfacial energies were obtained from measurements of dihedral angles at triple grain junctions between Ni and NiO grains. Extra reflections in diffraction patterns from oxide grains adjacent to the Ni/NiO interface were compared with kinematical structure factor calculations for several proposed structures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 48: Symposium E – Applied Materials Characterization , 1985 , 127
Copyright
Copyright © Materials Research Society 1985

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References

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