Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-11-25T17:33:26.495Z Has data issue: false hasContentIssue false
  • English
  • Français

Characterization of Ion Irradiated Zirconia-Yttria Films

Published online by Cambridge University Press:  28 February 2011

N. K. Huang ,
Z. R. Feng ,
Z. K. Xiong ,
D. Z. Wang  and
P. L. Wang
N. K. Huang
Affiliation:
Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, P.R. China
Z. R. Feng
Affiliation:
Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, P.R. China
Z. K. Xiong
Affiliation:
Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, P.R. China
D. Z. Wang
Affiliation:
Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, P.R. China
P. L. Wang
Affiliation:
Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, P.R. China
Get access

Abstract

Zirconia-yttria films containing 8.0wt% Y2O3 were prepared on a Si substrate with r.f. magnetron sputtering deposition followed by 170 KeV Ar+ ion irradiation at room temperature. The characterization of these zirconia-yttria films with different ion bombarding doses has been studied by XRD, XPS and AES. It was found that all the films consisted of three portions, the amorphous films deposited with r.f. magnetron-sputtering were partially crystallized and nontransformable tetragonal (T') phase was detected after Ar+ ion bombardment of a dose of 1×1016 ion/cm2, and the oxidized states of Zr3d, Y3d and Ols peaks of XPS were observed under the conditions of argon ion bombardment of different doses.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 235: Symposium A – Phase Formation and Modification by Beam-Solid Interactions , 1991 , 357
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1]. Jones, Fletcher, J. Vac. Sci. Technol. A6(6) (1988) 3088 Google Scholar
[2]. Martin, P. J., J. Mater. Sci. 21 (1986) 1 Google Scholar
[3]. Kao, A.S. and Gorman, G. L., J. Appl. Phys. 67 (1990) 3826 Google Scholar
[4]. Haguib, H.M. and Kelly, R., Radiation Effects 25 (1975) 1 Google Scholar
[5]. Iwamoto, Nobuya, Makino, Yukio and Kamai, Masayoshi, Thin Solid Films 153 (1987) 233 Google Scholar