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Characterization Of Capillary-Optic Materials For Use In X-Ray Lithography

Published online by Cambridge University Press:  15 February 2011

C. M. Dozier ,
M. I. Bell ,
D. A. Newman ,
R. K. Freitag ,
D. B. Brown  and
H. B. Rosenstock
C. M. Dozier
Affiliation:
Naval Research Laboratory, Washington, DC 20375–5345
M. I. Bell
Affiliation:
Naval Research Laboratory, Washington, DC 20375–5345
D. A. Newman
Affiliation:
SFA Inc. Landover, MD 20785
R. K. Freitag
Affiliation:
Naval Research Laboratory, Washington, DC 20375–5345
D. B. Brown
Affiliation:
Naval Research Laboratory, Washington, DC 20375–5345
H. B. Rosenstock
Affiliation:
SFA Inc. Landover, MD 20785
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Abstract

Capillary optics appear to permit the fabrication of practical collimator systems for laserdriven x-ray point sources. With such collimators, the illumination of wafers can meet the tight requirements for lithographic patterning of sub-micron device structures. However, the use of x-radiation with photon energies between 800–1200 eV makes capillaries of conventional silica-based glass capillaries marginal due to their low reflectivity. The reflectivity of various materials were examined with the goal of finding alternate glasses, elements for doping glasses or surface coatings that may enhance these collimators for lithographic applications. Coating capillary surfaces with more reflective materials may be the most viable method for improving the radiation transport properties for capillary optics to be used in x-ray lithography.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993 , 169
Copyright
Copyright © Materials Research Society 1993

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