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Characterization of (Ba,Sr)RuO3 Films Deposited by Metal-organic Chemical Vapor Deposition

Published online by Cambridge University Press:  17 March 2011

Duck-Kyun Choi ,
Joong-Seo Kang ,
Young-Bae Kim ,
Duck-Hwa Hong ,
Hyun-Chul Kim ,
Sung-Tae Kim  and
Cha-Young Yoo
Duck-Kyun Choi
Affiliation:
Department of Ceramic Engineering, Hanyang University Seoul 133-791, Korea
Joong-Seo Kang
Affiliation:
Department of Ceramic Engineering, Hanyang University Seoul 133-791, Korea
Young-Bae Kim
Affiliation:
Department of Ceramic Engineering, Hanyang University Seoul 133-791, Korea
Duck-Hwa Hong
Affiliation:
Department of Ceramic Engineering, Hanyang University Seoul 133-791, Korea
Hyun-Chul Kim
Affiliation:
Department of Ceramic Engineering, Hanyang University Seoul 133-791, Korea
Sung-Tae Kim
Affiliation:
Semiconductor R&D Division, Samsung Electronics Company
Cha-Young Yoo
Affiliation:
Semiconductor R&D Division, Samsung Electronics Company
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Abstract

Thin film electrodes of the perovskite oxide (Ba,Sr)RuO3 (BSR) were deposited on 4 inch ptype Si wafers by metal organic chemical vapor deposition (MOCVD) for the practical (Ba,Sr)TiO3 (BST) capacitor application using a new single cocktail source. The source materials used for the MOCVD BSR process were Ba(METHD)2, Sr(METHD)2 and Ru(METHD)3 and these were dissolved in n-butyl acetate. The source-feeding rate was precisely controlled by liquid mass flow controllers (LMFC). As-deposited BSR films possessed a (110)-oriented structure, with good uniformity and adherence on bare Si wafer. The phase formation was strongly affected by the oxygen flow rate and the input source rate. As the oxygen flow rate increased, the Ru/(Ba+Sr) composition ratio in the film decreased, while the Ba/(Ba+Sr) ratio was almost independent of the oxygen flow rate. The dielectric constants of BST capacitors fabricated using these electrodes was greater than 500.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 688: Symposium C – Ferroelectric Thin Films X , 2001 , C4.25.1
Copyright
Copyright © Materials Research Society 2002

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