Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-17T18:20:57.885Z Has data issue: false hasContentIssue false

Characteristics and Applications of Sr-Modified Ferroelectric Pb(Zr,Ti)O3 Thin Films

Published online by Cambridge University Press:  10 February 2011

K. B. Lee
Affiliation:
Dept. of Physics, Sangji Univ., Wonju, Kangwondo 220–702, Korea
B. K. Ju
Affiliation:
Division of Electronics and Information Technology, KIST, Seoul 130–650, Korea
Seshu B. Desu
Affiliation:
Dept. of Computer and Electrical Engineering, Univ. of Massachusetts, Amherst, MA 01003
Get access

Abstract

We have investigated the structural and electrical properties of Sr-modified Pb(Zr,Ti)O3, i.e., (Pb1-xSrx)(Zr0.53Ti0.47)O3 (PSZT), thin films. Sol-gel derived PSZT films were deposited by spin casting onto Pt/Ti/SiO2/Si substrates. Ferroelectric perovskite phases were found for all specimens (x ≤ 0.6), which implied the successful substitution of Sr for Pb. The values of dielectric constant (εr) as well as remanent polarization (Pr) of PSZT capacitors decreases monotonically with increasing Sr for x ≥ 0.1. PSZT (x=0.4) thin film was found to be applicable to high permittivity films for high density dynamic random access memories, whose Pr and εr are 5 μC/cm2 and 350, respectively, and leakage current density is low as 1×10−7 A/cm2 at a electric field of 100 kV/cm. In this paper, we also discuss the characteristics of Sr-modified PbTiO3 thin films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Scott, J. F. and Paz de Araujo, C. A., Science 246, 1400 (1989).Google Scholar
2. Teowee, G., Quackenbush, E. L., Baertlein, C. D., Boulton, J. M., Kneer, E. A. and Uhlmann, D. R., Ferroelectric Thin Films IV, edited by Tuttle, B. A., Desu, S. B., Ramesh, R. and Shiosaki, T. (Mater. Res. Soc. Proc. 361, Boston, MA 1994), pp. 433438.Google Scholar
3. Desu, S. B., Phys. Stat. Sol. (a) 151, 467 (1995).Google Scholar
4. Lee, K. B. and Cho, S. K., J. Mat. Sci. 33, 5707 (1998).Google Scholar
5. Chen, S. Y. and Chen, I. W., J. Am. Ceram. Soc. 77, 2332 (1994).Google Scholar
6. Vijay, D. P. and Desu, S. B., J. Electrochem. Soc. 140, 2640 (1993).Google Scholar
7. Shimizu, M., Fujisawa, H., Hyodo, S., Nakamura, S., Niu, H., Okino, H. and Shiosaki, T., Ferroelectric Thin Films VI, edited by Treece, R. E., Jones, R. E., Foster, C. M., Desu, S. B. and Yoo, I. K. (Mater. Res. Soc. Proc. 493, Boston, MA, 1997) pp. 159164.Google Scholar
8. Alexe, M., Senz, St., Pignolet, A., Scott, J. F., Hesse, D. and Gosele, U., Ferroelectric Thin Films VI, edited by Treece, R. E., Jones, R. E., Foster, C. M., Desu, S. B. and Yoo, I. K. (Mater. Res. Soc. Proc. 493, Boston, MA, 1997) pp. 517522.Google Scholar
9. Kwok, C. K. and Desu, S. B., Ferroelectric Thin Films, edited Balla, A. S. and Nair, K. M. (Ceramic Transactions 25, American Ceramic Society, Westerville, OH, 1992), pp. 8596.Google Scholar
10. Schubring, N. W., Mantese, J. V., Micheli, A. L., Catalan, A. B. and Lopez, R. J., Phys. Rev. Lett. 68, 1778 (1992).Google Scholar