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Boltzmann Transport Equation Analysis of Ion Implantation Range and Damage Distributions†
Published online by Cambridge University Press: 25 February 2011
Abstract
The Boltzmann transport equation has been used to calculate range anddamage distributions in multilayer targets of general interest for semiconductor fabrication. A comprehensive review of the calculations will be presented, with particular emphasis on how large angle scattering events and channeling phenomena may be included. Examples of the quality of fit between the theory and experiment show that difficult phenomena (such as residual channeling) can be reasonable modelled.
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- Research Article
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- Copyright
- Copyright © Materials Research Society 1985
Footnotes
Paper presented in symposium but not published.
References
† Paper presented in symposium but not published.