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Behavior of copper in CdGeAs2 crystals

Published online by Cambridge University Press:  01 February 2011

Valeriy G. Voevodin
Affiliation:
Siberian Physico-Technical Institute 1 Revolution sq., 634050, Tomsk, Russia
Olga V. Voevodina
Affiliation:
Siberian Physico-Technical Institute 1 Revolution sq., 634050, Tomsk, Russia
Svetlana A. Bereznaya
Affiliation:
Siberian Physico-Technical Institute 1 Revolution sq., 634050, Tomsk, Russia
Zoya V. Korotchenko
Affiliation:
Siberian Physico-Technical Institute 1 Revolution sq., 634050, Tomsk, Russia
Melvin C. Ohmer
Affiliation:
Air Force Research Lab, Materials Directorate, AFRL/MLPSO Wright-Patterson Air Force Base, Dayton Ohio, 45433-7707, USA
Jonathan T. Goldstein
Affiliation:
Air Force Research Lab, Materials Directorate, AFRL/MLPSO Wright-Patterson Air Force Base, Dayton Ohio, 45433-7707, USA
Nils C. Fernelius
Affiliation:
Air Force Research Lab, Materials Directorate, AFRL/MLPSO Wright-Patterson Air Force Base, Dayton Ohio, 45433-7707, USA
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Abstract

We present an investigation of the diffusion and melt doping of Cu in CdGeAs2. Cu was found to be an acceptor, its introduction in the melt allowed the controlled introduction of holes from ∼8·1016 cm-3 to ∼1·1018 cm -3. Introduction of Cu from the melt was also found to improve the homogeneity of the crystal. The saturation solubility of Cu introduced via diffusion doping was found to have an exponential dependence on the diffusion temperature, from 723 K to 873 K, obeying the equation N = N0 exp (- δH / kT) with the parameters N0 = 6.10+19 cm-3, δH = 0.3 eV, and k equal to Boltzman's constant. From 873 K to 923 K, the saturation solubility was found to decrease exponentially with temperature.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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References

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