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Basic Thin Film Process for Perovskite Ferroelectric Materials

Published online by Cambridge University Press:  16 February 2011

Hideaki Adachi  and
Kiyotaka Wasa
Hideaki Adachi
Affiliation:
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.Moriguchi, Osaka 570, Japan
Kiyotaka Wasa
Affiliation:
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.Moriguchi, Osaka 570, Japan
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Abstract

Thin film process for ferroelectric perovskite oxides has been investigated. Amorphous, polycrystal, and epitaxial thin films of Pb-based perovskite ferroelectrics were prepared by rf-magnetron sputtering, and their properties were discussed. Epitaxial PLZT thin films showed similar dielectric properties as PLZT bulk ceramics and also showed strong electrooptic effect. For further investigation, film preparation process was developed by multitarget sputtering and quaternary PLZT thin film with excellent epitaxial crystallinity was realized by using a graded composition layer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 103
Copyright
Copyright © Materials Research Society 1990

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References

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