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Barrier Effect of Retrograde Well Against Ion-Induced-Charge Carriers

Published online by Cambridge University Press:  22 February 2011

Hirokazu Sayama ,
Takehisa Kishimoto ,
Mikio Takai ,
Hiroshi Kimura ,
Yoshikazu Ohno ,
Ken-Ichiro Sonoda ,
Norihiko Kotani  and
Shin-Ichi Satoh
Hirokazu Sayama
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Takehisa Kishimoto
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Mikio Takai
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Hiroshi Kimura
Affiliation:
ULSI Laboratory, Mitsubishi Electric Corporation, Itami, Hyogo 664, Japan
Yoshikazu Ohno
Affiliation:
ULSI Laboratory, Mitsubishi Electric Corporation, Itami, Hyogo 664, Japan
Ken-Ichiro Sonoda
Affiliation:
ULSI Laboratory, Mitsubishi Electric Corporation, Itami, Hyogo 664, Japan
Norihiko Kotani
Affiliation:
ULSI Laboratory, Mitsubishi Electric Corporation, Itami, Hyogo 664, Japan
Shin-Ichi Satoh
Affiliation:
ULSI Laboratory, Mitsubishi Electric Corporation, Itami, Hyogo 664, Japan
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Abstract

The charge collection efficiency of a diode with a retrograde well was estimated using focused ion beam irradiation at 400 keV and 2 MeV. The retrograde well was found to effectively suppress a collection of charge carriers created by energetic particles. The charge collection efficiency of the diode with the retrograde well was ~ 25 % lower than that with the conventional well when 400 keV ~ 2 MeV protons were irradiated normal to diodes. This result was in good agreement with device simulation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 313
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

1 Fang, R.C. and Moll, J.L., IEEE Trans. Electron Devices, ED–31, 113 (1984).Google Scholar
2 Abbas, S.A. and Dockerty, R.C., Appl. Phys. Lett., 27, 147 (1975).Google Scholar
3 May, T.C. and Woods, M.H., IEEE Trans. Electron Devices, ED–26, 2 (1979).Google Scholar
4 Hsieh, C.M., Murley, P.C., and O'Brien, R.R., IEEE Electron Device Letters, EDL–2, 103 (1981).Google Scholar
5 Takemae, Y., Ema, T., Nakano, M., Baba, F., Yabu, T., Miyasaka, K., and Shirai, K., International Solid-State Circuits Conference Digest (IEEE), 250 (1985).Google Scholar
6 Sunami, H., Kure, T., Hashimoto, N., Toyabe, T., and Asai, S., IEEE Electron Device Letters, EDL–4, 90 (1983).Google Scholar
7 Tsukamoto, K., Komori, S., Kuroi, T., and Akasaka, Y., Nuclear Instruments and Methods in Physics Research, B59/60, 584 (1991).Google Scholar
8 Campero, A.M. and Love, R.P., J. Electrochem. Soc, 131, 655 (1984).Google Scholar
9 Sayama, H., Takai, M., Akasaka, Y., Tsukamoto, K., and Namba, S., Jpn. J. Appl. Phys., 28, L1673 (1989).Google Scholar
10 Sayama, H., Takai, M., Yuba, Y., Namba, S., Tsukamoto, K., and Akasaka, Y., Appl. Phys. Lett., 61, 1682 (1992).Google Scholar
11 Arimoto, K., Hidaka, H., Hayashikoshi, M., Asakura, M., Fujishima, K., and Yoshihara, T., European Solid-State Circuits Conference, 21 (1991).Google Scholar
12 Sayama, H., Hara, S., Kimura, H., Ohno, Y., Satoh, S., and Takai, M., Jpn. J. Appl. Phys., 31, 4541 (1992).Google Scholar
13 Sayama, H., Kimura, H., Ohno, Y., Satoh, S., Sonoda, K., Kotani, N., and Takai, M., Jpn. J. Appl. Phys., (In Press).Google Scholar
14 Breese, M.B.H., Grime, G.W., and Watt, F., Nuclear Instruments and Methods in Physics Research, B77, 301 (1993).Google Scholar
15 Pichler, P., Barthel, A., Durr, R., Holzer, N., Lorenz, J., Ryssel, H., and Schott, K., Proceedings NASECODE VI Software Forum Digest, (1989).Google Scholar
16 Ziegler, J.F., Biersack, J.P., and Littmark, U.. The stopping and range of ions in solids. (Pergamon Press, New York, 1985).Google Scholar