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Atomic Layer Epitaxy of Wide Bandgap II-VI Compound Semiconductor Superlattices

Published online by Cambridge University Press:  21 February 2011

M. Konagai
Affiliation:
Tokyo Institute of Technology, Dept. of Electrical and Electronic Engineering, 2-12-1, Ohokayama, sMeguro-ku, Tokyo 152, Japan
Y. Takemura
Affiliation:
Tokyo Institute of Technology, Dept. of Electrical and Electronic Engineering, 2-12-1, Ohokayama, sMeguro-ku, Tokyo 152, Japan
R. Kimura
Affiliation:
Tokyo Institute of Technology, Dept. of Electrical and Electronic Engineering, 2-12-1, Ohokayama, sMeguro-ku, Tokyo 152, Japan
N. Teraguchi
Affiliation:
Tokyo Institute of Technology, Dept. of Electrical and Electronic Engineering, 2-12-1, Ohokayama, sMeguro-ku, Tokyo 152, Japan
K. Takahashl
Affiliation:
Tokyo Institute of Technology, Dept. of Electrical and Electronic Engineering, 2-12-1, Ohokayama, sMeguro-ku, Tokyo 152, Japan
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Abstract

ZnSe, ZnTe and ZnSe-ZnTe strained-layer superlattices (SLS's) have been successfully grown by atomic layer epitaxy (ALE) using molecular beam epitaxy (MBE-ALE). The ideal ALE growth, i.e., one monolayer per cycle of opening and closing the shutters of the constituent elements, was obtained for ZnSe in the substrate temperature range of 250-350° C. However, for ZnTe, precise control of the Te beam intensity is needed to obtain the ALE growth. Optical properties of the (ZnSe)l-(ZnTe) 1 SLS were evaluated by photoluminesence. ZnSe films were also grown by ALE using metalorganic molecular beam epitaxy (MOMBE-ALE). Diethylzinc (DEZn), diethylsulfur (DES) and diethylselenium (DESe) were used as source gases for Zn, S and Se, respectively. The ALE growth of ZnSe was achieved at substrate temperature between 250 and 300° C which is about 150° C lower than that for the conventional MOMBE.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

[1] Kobayashi, M., Mino, N., Katagiri, H., Kimura, R., Konagai, M. and Takahashi, K., J.Appl.Phys. 60 (1986) 773 Google Scholar
[2] Kobayashi, M., Konagai, M., Takahashi, K. and Urabe, K., J.Appl.Phys. 61 (1987) 1015 Google Scholar
[3] Kobayashi, M., Dosho, S., Imai, A., Kimura, R., Konagai, M. and Takahashi, K., Appl.Phys.Lett. 51 (1987) 1602 Google Scholar
[4] Imai, A., Kobayashi, M., Dosho, S., Konagal, M. and Takahashi, K. J.Appl.Phys. 64 (1988) 647 Google Scholar
[5] Konagai, M., Dosho, S., Takemura, Y., Teraguchl, N., Kimura, R. and Takahashi, K. in Growth and optical properties of wide-bandgap II-VI low-dimensional semiconductors, edited by McGill, T.C., Torres, C.M. Sotomayor andGebhardt, W. (Plenum Publishing Co., 1989) p.219 Google Scholar
[6] Dosho, S., Takemura, Y., Konagai, M. and Takahashi, K. J.Cryst.Growth, 95 (1989) 580 Google Scholar
[7] Teraguchi, N., Takemura, Y., Klmura, R., Konagai, M. and Takahashi, K. J.Cryst.Growth, 93 (1988) 720 Google Scholar
[8] Dosho, S., Takemura, Y., Konagai, M. and Takahashi, K. J.Appl.Phys. 66 (1989) 2597 Google Scholar
[9] Yao, T., Kato, M., Davis, J.J. and Tanino, H. J.Cryst.Growth 86 (1988) 552 Google Scholar