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Applications of Raman Spectroscopy in Cu CMP: In-situ Detection of Chemical Species in the Slurry

Published online by Cambridge University Press:  01 February 2011

Siddartha Kondoju ,
Pierre Lucas ,
Srini Raghavan ,
Paul Fischer ,
Mansour Moinpour  and
Andrea Oehler
Siddartha Kondoju
Affiliation:
[email protected], The University of Arizona, Materials Science and Engineering, 4715 E Fortlowell Rd, Tucson, AZ, 85719, United States
Pierre Lucas
Affiliation:
[email protected], The University of Arizona, Tucson, AZ, 85721, United States
Srini Raghavan
Affiliation:
[email protected], The University of Arizona, Tucson, AZ, 85721, United States
Paul Fischer
Affiliation:
[email protected], Intel Corp., Components Research, Portland, OR, 97124, United States
Mansour Moinpour
Affiliation:
[email protected], Intel Corp., Components Research, Santa Clara, CA, 95052, United States
Andrea Oehler
Affiliation:
[email protected], Intel Corp., Fab Materials, Portland, OR, 97124, United States
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Abstract

Slurries used for copper CMP have a rich chemistry, which may change during the course of polishing due to consumption and decomposition of molecular species. Various aspects, such as small layer thickness (<50 μm), continuous flow of the slurry, and dynamics of the film removal process pose great challenge to the monitoring of slurry components between the pad and the wafer. The slurry constituents such as oxidants and corrosion inhibitors have unique signatures that can be detected using spectroscopic techniques. In this paper, work carried out to explore the use of Raman spectroscopy to detect and quantitate chemical species such as hydroxylamine, benzotriazole and hydrogen peroxide in-situ will be presented. More detailed study pertaining to the protonation of hydroxylamine with respect to the pH will also be presented. An abrasion cell integrated with a Raman spectrometer was used to make the measurements.

Keywords

CMPslurryRaman spectroscopy
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 914: Symposium F – Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects , 2006 , 0914-F12-02
Copyright
Copyright © Materials Research Society 2006

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References

Refereces

1 Cerni, T. A., 24th Annual SPWCC conference, Feb 2005.Google Scholar
2 Small, R.J., McGhee, L., Maloney, D. and Patterson, M.L., “Chemical mechanical polishing chemicals and process,” WO Patent 98/04646, (1998).Google Scholar
3 Peterson, M.L., Small, R.J., Truong, T. and Lee, J., Semiconductor Fabtech, 11th edition, (2000).Google Scholar
4 Puy, M. Van der and Dimmit, J.H., Hydroxylamine: Redox Properties of Hydroxylamines, Part 1. Inorganic Reactions. Technical Bulletins, AlliedSignal Inc., (1985).Google Scholar
5 Pelletier, M. J., Davis, K. L., and Carpio, R. A., Electrochem Soc. Proceedings, (1995).Google Scholar
6 Wang, F., Watcher, J.A., Antosz, F.J., and Berglund, K. A., Organic Process Research & Development, 4, 391–395 (2000).Google Scholar
7 Bell, W C., Booksh, K S., and Myrick, M L., Anal. Chem. 70, 332–339 (1998).Google Scholar
8 Kondoju, S., Juncker, C., Lucas, P., Raghavan, S., Fischer, P, Moinpour, M., and Oehler, A, submitted to J.App. Phys Dec (2005).Google Scholar
9 Kondoju, S., Juncker, C., Lucas, P., Raghavan, S., P Fischer, Moinpour, M., and Oehler, A, Mater. Res. Soc. Symp. Proc. Vol. 867 175–181 (2005).Google Scholar
10 Tamilmani, S., Huang, W., Raghavan, S., and Small, R., J. Electrochem. Soc., 149, G638 (2002).Google Scholar
11 Rubim, J., Gutz, I. G. R., Sala, O., and Orville-Thomas, W. J., Journal of Molecular Structure, 100, 571–583 (1983).Google Scholar
12 Thomas, S., Venkateswaran, S., Kapoor, S., Cunha, R. D., and Mukherjee, T., Spectrochimica Acta Part A, 60, 25–29 (2004).Google Scholar