Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-25T17:57:41.469Z Has data issue: false hasContentIssue false
  • English
  • Français

Annealing Effects of Indium-Tin Oxide Films Produced by Atmospheric RF Plasma Deposition Technique

Published online by Cambridge University Press:  15 February 2011

R. W. Moss ,
D. H. Lee ,
K. D. Vuong ,
J. Ryan ,
J. Fagan ,
R. A. Condrate  and
X. W. Wang
R. W. Moss
Affiliation:
Alfred University, Alfred, New York, 14802
D. H. Lee
Affiliation:
Alfred University, Alfred, New York, 14802
K. D. Vuong
Affiliation:
Alfred University, Alfred, New York, 14802
J. Ryan
Affiliation:
Alfred University, Alfred, New York, 14802
J. Fagan
Affiliation:
Alfred University, Alfred, New York, 14802
R. A. Condrate
Affiliation:
Alfred University, Alfred, New York, 14802
X. W. Wang
Affiliation:
Alfred University, Alfred, New York, 14802
Get access

Abstract

Thin-films of indium-tin oxide (ITO) on soda-lime-silicate (SLS) glass were fabricated using an atmospheric RF plasma mist deposition process. Some of the films were deposited at substrate temperatures between 400 C and 500 C, and were subsequently annealed at 400 C and 530 C for 1 hour. Conductivity was improved due to post-annealing. Film thickness, particle size, film morphology and crystallite size were characterized. The structural changes on the glass and the ITO film were investigated by DRIFT spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 403: Symposium I – Polycrystalline Thin Films: Structure, Texture, Properties and Applications II , 1995 , 429
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Williams, J.A., Shen, C. Q., Vuong, K.D., Tenpas, E., Helin, E., Condrate, R.A. Sr., Lee, D.H., Wang, H., Fagan, J., and Wang, X.W., Mat. Res. Soc. Proc. 355, Pittsburgh, PA 1995, p. 563.Google Scholar
2. Vuong, K.D., Schueselbauer, E., Lee, D.H., Williams, J.A., and Wang, X.W., in Thermal Spray Proc. of the 8th National Thermal Spray Conference, Houston, TX 1995, p. 93,Google Scholar
3. N., Balasubramanian, N., Subrahmanyam, Mater. Sci. and Engineering, vB1, p. 279 (1988).Google Scholar
4. Husung, R.D. and Doremus, R.H., J. Mater. Res. 5, p. 2209 (1990).Google Scholar
5. Clark, D.E., Dilamore, M.F., Ethride, E.C., and Hench, L.L., Glass Technol. 18, p. 121 (1977).Google Scholar
6. Clark, D.E., Dilamore, M.F., Ethride, E.C., Hench, L.L., J. Am. Ceram. Soc. 59, p. 62 (1976).Google Scholar
7. Zhou, X., Johnson, P.E., Condrate, R.A., Sr., Guo, Y.M., Mater. Letters 9, p. 207 (1990).Google Scholar