Hostname: page-component-78c5997874-mlc7c Total loading time: 0 Render date: 2024-11-16T15:04:49.918Z Has data issue: false hasContentIssue false
  • English
  • Français

Annealing Characteristics of Electron Beam Evaporated Magnesium Oxide Thin Film

Published online by Cambridge University Press:  10 February 2011

Y. C. Kang ,
J. B. Baik ,
B. H. Lee ,
J. H. Choi ,
J. M. Kim  and
K. Y. Park
Y. C. Kang
Affiliation:
Samsung Display Devices Co., Ltd., 575, Shin-Dong, Paldal-Gu, Suwon-City, Kyungki-Do, Korea, 442–390, [email protected]
J. B. Baik
Affiliation:
Samsung Display Devices Co., Ltd., 575, Shin-Dong, Paldal-Gu, Suwon-City, Kyungki-Do, Korea, 442–390, [email protected]
B. H. Lee
Affiliation:
Samsung Display Devices Co., Ltd., 575, Shin-Dong, Paldal-Gu, Suwon-City, Kyungki-Do, Korea, 442–390, [email protected]
J. H. Choi
Affiliation:
Display Materials Lab, Materials Sector, Samsung Advanced Inst of Tech, Suwon, Korea.
J. M. Kim
Affiliation:
Display Materials Lab, Materials Sector, Samsung Advanced Inst of Tech, Suwon, Korea.
K. Y. Park
Affiliation:
Samsung Display Devices Co., Ltd., 575, Shin-Dong, Paldal-Gu, Suwon-City, Kyungki-Do, Korea, 442–390, [email protected]
Get access

Abstract

The effect of the annealing characteristics of MgO thin film, which is used as a protecting layer and known to play an important role to life time and lower the firing voltage in AC plasma displays, was investigated experimentally. MgO films were deposited on glass substrates by an electron beam evaporation method and annealed at different temperatures with varying heat treatment time. The characteristics of the crystallization and surface morphology of MgO films were changed by various annealing conditions, confirmed with X-ray diffraction method and scanning and transmission electron microscopes (SEM & TEM). With increasing annealing time and higher temperature, the intensity of the X-ray diffraction peak and the crystalline grain size of MgO increases. With the change of crystallinity and the decrease in grain boundary area, it is considered that the characteristics of firing voltage and life time of the plasma display panel can be improved with appropriate annealing process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 471: Symposium G – Flat Panel Display Materials III , 1997 , 87
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Kaneko, R., at al: SID 78 Dig., p. 46, (1978)Google Scholar
2. Úrade, T., Iemri, T., Nakayama, N. and Monta, I.: IEEE Transactions on Electron Devices. Vol. 23, No. 3, March 1976 Google Scholar
3. Machida, K., Uchiike, H. and Sasaki, H.: SID 92 Dig, p 531 (1992)Google Scholar
4. Koiwa, I., Kanehara, T. and Mita, J.: J. Electrochem. Soc., Vol. 142, No. 5, May (1995)Google Scholar
5. Ito, M., Yokoi, T., Kikuchi, N., Sago, S. and Kani, A.: IEICE Vol 94, No 122, p 37 (1995)Google Scholar
6. Kamiya, M.: plus E p 90 (1996)Google Scholar
7. Uchiike, H. and Harada, S.: SID 91 Dig., p 444 (1991)Google Scholar
8. Aboelfotoh, M. O.: SID Dig., p 62 Google Scholar