Hostname: page-component-cd9895bd7-gbm5v Total loading time: 0 Render date: 2024-12-27T01:49:40.407Z Has data issue: false hasContentIssue false
  • English
  • Français

Anisotropy in Epitaxial Fe3O4 and NiFe2O4 Thin Films

Published online by Cambridge University Press:  15 February 2011

D. T. Margulies ,
F. T. Parker ,
F. E. Spada  and
A. E. Berkowitz
D. T. Margulies
Affiliation:
Center for Magnetic Recording Research, University of California at San Diego, La Jolla, California 92093-0401
F. T. Parker
Affiliation:
Center for Magnetic Recording Research, University of California at San Diego, La Jolla, California 92093-0401
F. E. Spada
Affiliation:
Center for Magnetic Recording Research, University of California at San Diego, La Jolla, California 92093-0401
A. E. Berkowitz
Affiliation:
Center for Magnetic Recording Research, University of California at San Diego, La Jolla, California 92093-0401
Get access

Abstract

Fe3O4 and NiFe2O4 films were deposited on <100> and <110> MgO substrates by dc magnetron reactive sputtering. X-ray diffraction studies indicate epitaxial films under an inplane tensile stress. Magnetization studies show that the moments of the films are unsaturated in 70 kOe applied fields and they approach bulk values only in extrapolation. Conversion electron Mössbauer spectroscopy (CEMS) studies indicate bulk parameters for the Fe3O4 films, but show deviations from bulk properties for NiFe2O4 films. CEMS studies further indicate a random moment distribution for all films which is an unexpected property. In-plane torque curves are discussed in terms of single crystal behavior. The effect of the inplane tensile stress is also indicated in the torque curves.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 341: Symposium F – Epitaxial Oxide Thin Films and Heterostructures , 1994 , 53
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Lind, D. M., Berry, S. D., Chern, G., Mathias, H., and Testardi, L. R., Phys. Rev. B 45, 1838 (1992).Google Scholar
2 Fujii, T., Takano, M., Katano, R., and Bando, Y., J. Cryst.Growth 99, 606 (1990).Google Scholar
3 Margulies, D. T., Parker, F. T., and Berkowitz, A. E., J. Appl. Phys. 75 (1994).Google Scholar
4 Magnetic and Other Properties of Oxides and Related Compounds, ed. Hellwege, K. -H., Hellwege, A.M., Landolt Bbmstein, Vol.4, New Series (Springer-Verlag, Berlin 1970).Google Scholar
5 Cullity, B. D., Introduction to Magnetic Materials (Addison-Wesley, Reading, MA, 1972), pp. 216, 222, 270, 347.Google Scholar
6 Speriosu, V. S., Chen, M. M., and Suzuki, T., IEEE Trans. Magn. 25, 3875 (1989).Google Scholar
7 Evans, B. J. and Hafner, S. S., J. Appl. Phys. 40, 1411 (1969).Google Scholar
8 Parker, F. T. (private communication)Google Scholar