Hostname: page-component-cd9895bd7-dzt6s Total loading time: 0 Render date: 2024-12-27T02:14:23.414Z Has data issue: false hasContentIssue false
  • English
  • Français

Analytical Simulation of an Improved Cvi Process for Forming Highly Densified Ceramic Composites

Published online by Cambridge University Press:  21 February 2011

Nyan-Hwa Tai  and
Tsu-Wei Chou
Nyan-Hwa Tai
Affiliation:
Center for Composite Materials and Department of Mechanical Engineering, University of Delaware, Newark, Delaware 19716
Tsu-Wei Chou
Affiliation:
Center for Composite Materials and Department of Mechanical Engineering, University of Delaware, Newark, Delaware 19716
Get access

Abstract

A model for chemical vapor infiltration (CVI) under pressure and temperature gradients is applied to the study of deposition of SiC from the pyrolysis of CH3SiCl3 within a 3-D woven fibrous preform. The model considers the infiltration of reactants into a preform with temperature gradients by applying a pressure gradient between the vapor inlet and outlet; it also takes into account the variation in concentration of the vapor precursor. A quasi-steady state approach has been adopted to simulate the matrix deposition in a 3-D unit cell. The density distribution, consolidation profile, and total fabrication period have been theoretically predicted.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 61
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Rice, R.W., Am. Ceram. Soc. Bull., 62 [8]889 (1983)Google Scholar
2.Messner, R.P. and Chiang, Y.M., Ceram. Eng. Sci. Proc., 9 [7–8], 1053 (1988)Google Scholar
3.Hench, L.L. and Ulrich, D.R., Ultrastructure Processing of Ceramic. Glasses. and Composites, 1st edition, John Wiley &Sons, Inc., New York, (1984)Google Scholar
4.Clark, D.E., in Science of Ceramic Chemical Processin, edited by Hench, L.L. and Ulrich, D.R., John Wiley & Sons, Inc., New York, 237 (1986)Google Scholar
5.Rossignol, J.Y., Langlais, F. and Naslain, R., Chemical Vapor Deposition, Proc. CVDIX, The Electrochem. Soc., Pennington, 596 (1984)Google Scholar
6.Colmet, R., Naslain, R., Hagemuller, P., and Bernard, C., Chemical Vapor Deposition, Proc. CVD-VIII, The Electrochem. Soc., Pennington (1981)Google Scholar
7.Caputo, A. J., Lackey, W.J., and Stinton, D.P., Ceram. Eng. Sci. Proc., 6[7–8], 694, (1985)Google Scholar
8.Stinton, D. P., Besmann, T.M., and Lowden, R.A., Am. Ceram. Soc. Bull. 67 (2) (1988)Google Scholar
9.Besmann, T.M., Lowden, R.A., Stinton, D.P., and Starr, T.L., Proceedings of the Seventh European Conference on Chemical Vapour Deposition, C5-229, (1989)Google Scholar
10.Tai, N.H. and Chou, T. W., J. Am. Ceram. Soc., 73 (3), 414 (1989)Google Scholar
11.Starr, T.L., Ceram. Eng. Sci. Proc., 9 (7–8), 803 (1988)Google Scholar
12.Tai, N.H. and Chou, T. W., 91th Annual Meeting of the Am. Ceram. Soc., 81-SI-89, Indianapolis, IN (1989)Google Scholar
13.Hirschfielder, J.O., Curtiss, C.F., and Bird, R.B., Molecular Theory of Gases and Liquids, Wiley, New York, (1954)Google Scholar
14.Satterfield, C.N., Heterogeneous Catalysis in Practice, McGraw-Hill, New York, (1980)Google Scholar
15.Currie, J.A., Brit. J. Appl. Phys., 11, 318 (1960)Google Scholar
16.Brennfleck, K., Fitzer, E., Schoch, G., and Dietrich, M., Chemical Vapor Deposition, Proc. CVD-IX, The Electrochem. Soc., Pennington (1984)Google Scholar