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An Study of Influence of Imperfections on the Delamination of Diamond-Like Carbon Films

Published online by Cambridge University Press:  01 February 2011

Myoung-Woon Moon ,
Kyang-Ryel Lee ,
Jin-Won Chung  and
Kyu Hwan Oh
Myoung-Woon Moon
Affiliation:
Material Science and Engineering, Seoul National University, Seoul 151-742, KOREA.
Kyang-Ryel Lee
Affiliation:
Korea Institute of Science and Technology, P.O.Box 131, Cheongryang, Seoul 130-650, KOREA.
Jin-Won Chung
Affiliation:
Korea Institute of Science and Technology, P.O.Box 131, Cheongryang, Seoul 130-650, KOREA.
Kyu Hwan Oh
Affiliation:
Material Science and Engineering, Seoul National University, Seoul 151-742, KOREA.
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Abstract

The role of imperfections on the initiation and propagation of interface delaminations in compressed thin films has been analyzed using experiments with diamond-like carbon (DLC) films deposited onto glass substrates. The surface topologies and interface separations have been characterized by using the Atomic Force Microscope (AFM) and the Focused Ion Beam (FIB) imaging system. The lengths and amplitudes of numerous imperfections have been measured by AFM and the interface separations characterized on cross sections made with the FIB. Chemical analysis of several sites, performed using Auger Electron Spectroscopy (AES), has revealed the origin of the imperfections. The incidence of buckles has been correlated with the imperfection length.

Keywords

Chemical vapor deposition (CVD)DefectDelaminationFIB.
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 719: Symposium F – Defect- and Impurity-Engineered Semiconductors and Devices III , 2002 , F8.36
Copyright
Copyright © Materials Research Society 2002

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References

1. Evans, A. G. and Hutchinson, J. W., Int. J. Solids Struct., 1984, 20, 455.Google Scholar
2. Gille, G. and Rau, B., Thin Solids Films, 1984, 120, 109.Google Scholar
3. Colin, J., Cleymand, F., Coupeau, C. and Grilhe, J., Phil. Mag. A, 2000, 80, 2559.Google Scholar
4. Hutchinson, J. W., Thouless, M. D. and Liniger, E. G., Acta Metal. Mater., 1992, 40, 295.Google Scholar
5. Hutchinson, J. W. and Suo, Z., Adv. Appl. Mech., 1992, 29, 63.Google Scholar
6. Evans, A. G., Hutchinson, J. W. and He, M. Y., Acta Mater., 1999, 47, 1513.Google Scholar
7. Hutchinson, J. W., He, M. Y. and Evans, A. G., J. Mech. Phys. Solids, 2000, 48, 709.Google Scholar
8. Cho, S.-J., Lee, K.-R., Eun, K. Y., Hahn, J. H. and Ko, D.-H., Thin Solid Films, 1999, 341, 207.Google Scholar
9. Moon, M.-W., Oh, K. H., Hutchinson, J. W., Jenson, H. M. and Evans, A. G., Accepted in J. Mech. Phys. Solids.Google Scholar
10. Weiderhorn, S. M., J. Am. Ceram. Soc., 1967, 50, 407.Google Scholar