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An Overview of Plasma Processing

Published online by Cambridge University Press:  15 February 2011

Julian Szekely
Julian Szekely*
Affiliation:
Department of Materials Science and Engineering and Center for Materials Processing, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Abstract

An overview is presented of the plasma processing of materials. The principal components of this overview include the definition and classification of plasmas of interest in materials processing, the methods of plasma generation and the basic engineering principles that govern plasma phenomena. Here emphasis is placed on both plasma theory and on the experimental verification of the models. This is followed by a brief description of principal plasma applications, including thermal plasmas used in melting, refining, plasma deposition and plasma synthesis and low pressure plasmas used in synthesis and in the processing of electronic materials.

The review is concluded by a brief discussion of future prospects for plasma technology, where the main developments envisioned are in the area of improved coatings, the processing of electronic materials, melting and refining of refractory metals and superalloys and finally the possibility of more widespread use for plasma systems in extractive metallurgy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 30: Symposium L – Plasma Processing and Synthesis of Materials I , 1983 , 1
Copyright
Copyright © Materials Research Society 1984

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References

REFERENCES

1. Boulos, M.I., Proceedings of this Symposium.Google Scholar
2. Szekely, J., Proceedings of 7th International Conference on Vacuum Metallurgy pp 1028 Tokyo, Japan (1982) Google Scholar
3. McKelliget, J., Szekely, J., Vardelle, M. and Fauchais, P., Temperature J. Plasma Chemistry and Plasma Processing, 2, (3), 315, (1982).Google Scholar
4. Correa, S.M., Boulos, M.I., Boulos, M.I. eds. 6th International Symposium on Plasma Chemistry Universite de Sherbrooke and McGill University Publishers, pp 77, 1983.Google Scholar
5. Celmenti, D. and Beneson, D.M., Boulos, M.I. eds. 6th International Symposium on Plasma Chemistry Universite de Sherbrooks and McGill University Publishers, pp 126, 1983.Google Scholar
6. Lewis, J.A., Gauvin, W.H., A.I.Ch.E. Jnl., 19, (5), 982–990, (1973).Google Scholar
7. Bhattacharyya, D., Gauvin, W.H., A.I.Ch.E. Jnl., 21, (5), 879–885, (1975).Google Scholar
8. Sayegh, N.N., Gauvin, W.H., A.I.Ch.E. Jnl., 25,(3), 522–534, (1979).Google Scholar
9. Pfender, E. and Lee, Y.C. - Proceedings of this Symposium.Google Scholar
10. Apelian, D., Proceedings of this SymposiumGoogle Scholar
11. Kaczmarek, R., Robert, W., Jurewitz, J. and Boulos, M.I., Proceedings of this symposium.Google Scholar
12. Fauchais, P., Proceedings of this Symposium.Google Scholar
13. Khait, Y.L., Proceedings of this Symposium.Google Scholar
14. Boulos, M.I. and Muntz, R.J. eds. 7th International Symposium on Plasma Chemistry, Universite de Sherbrooke and McGill University Publishers, 1983.Google Scholar
15. Mogab, C.J. and Winters, H.F., in Report of the National Materials Advisory Board on Plasma Processing, NRC, 1984.Google Scholar
16. Bell, A.T., Fundamentals of Plasma Chemistry.Google Scholar
17. Kushner, M., J. Appl. Phys. 53, 4, pp 2923, (1982).Google Scholar
18. Garscadden, A., in Boulos, M.I. and Muntz, R.J. eds., 6th, International Symposium on Plasma Chemistry, pp 388, (1983).Google Scholar
19. Turban, G., Catherine, Y. and Grolleau, B., Plasma Chemistry and Plasma Processing, 2, No. 1 pp 61, (1982).Google Scholar
20. Knights, J.C., Schmitt, J.P.P., Perrin, J. and Guelachvilli, G., J. Chem. Phys. 76, 7, pp 3424, (1982).Google Scholar
21. Wagner, J.J. and Veprek, S., Plasma Chemistry and Plasma Processing, 3, No. 2, 219, (1983).Google Scholar
22. Szekely, J., Reif, R. and Balazs, A. - to be published.Google Scholar
23. Roman, W., Proceedings of this SymposiumGoogle Scholar