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An Overview of Laser Chemical Processing
Published online by Cambridge University Press: 28 February 2011
Abstract
A overview of the recent developments in laser chemical processing is provided. The review covers advances in understanding fundamental process physics, the development of new techniques, and the implementation of applications.
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References
4.
Bartosch, C.E., Gluck, N.S., Ho, W., and Ying, Z., Phys. Rev. Lett.
57, 1425 (1986).Google Scholar
5.
Jackman, R.B. and Foord, J.S. in Extended Abstracts, MRS Symposium on Beam-Induced Chemical Reactions, Boston, 1984.Google Scholar
6.
Tabares, F.L., Marsh, E.P., Bach, A., and Cowin, J.P., J. Chem. Phys. (to be published); see also an earlier account on a similar system, E.B. Bourdon, J.P. Cowin, I. Harrison, J.C. Polanyi, J. Segner, C.D. Stanners, and P.A. Young, J. Chem. Phys. 88, 6100 (1984).Google Scholar
7.
Morrison, S.R., Electrochemistry at Semiconductor and Oxidized Electrodes, New York: Plenum, 1980.Google Scholar
8.
Podlesnik, D.V., Gilgen, H.H., and Osgood, R.M., Appl. Phys Lett.
45, 563 (1984); see also a review of this work in D.V. Podlesnik, H.H. Gilgen, A.E. Willner, and R.M. Osgood, Jr., J. Opt. Soc. Am. 3, 13 (1986).Google Scholar
9.
Yu, C.F., Podlesnik, D.V., Schmidt, M.T., Gilgen, H.H., and Osgood, R.M. Jr, Chem. Phys. Lett.
130, 301 (1986).Google Scholar
10.
Podlesnik, D.V., Gilgen, H.H., and Osgood, R.M., Appl. Phys. Lett.
48, 496 (1986).Google Scholar
11.
Ehrlich, D.J., Osgood, R.M., amd Deutsch, T.J., VLSI Electronics, Microstructure Science, 7, 129 (1983).Google Scholar
13.
Ehrlich, D.J., Osgood, R.M., and Deutsch, T.J., Appl. Phys. Lett.
38, 1018 (1981).Google Scholar
14.
Irvine, S.J.C., Mullen, J.B., and Tunnicliffe, J., J. Crystal Growth
68, 188 (1984); J.B. Mullen, and S.J.C., J. Vac. Sci. Tech, A4, 700 (1986).Google Scholar
15.
Bedair, S.M., Whisnant, J.K., Karam, N.H., Teschler, M.A., and Katsyama, T., Appl. Phys. Lett.
48
174 (1986).Google Scholar
16.
Holton, W.C., and Key, J. R., Semiconductor Research Corporation (private communication).Google Scholar
17.
Lopez, G.L. and Tabat, M.D. in Extended Abstracts of the MRS Symposium on Beam-Induced Chemical Processes, Boston, 1984.Google Scholar
19.
Osgood, R.M., Brewer, P., Holber, W., Chu, J., Evans, H., Yang, E., and Chen, J., Extended Abstracts, MRS Symposium on the Beam-Induced Chemical Processes, Boston, 1984; P.B. Brewer, D. McClure, and R.M. Osgood, Jr., Appl. Phys. Letts. 49, 13 (1986).Google Scholar
20.
Hayasaka, N., Okano, H., Sekine, M., and Horiike, Y., Appl. Phys. Letts.
48, 1166 (1986); projection etching is described in Y. Horiike, Appl. Phys. (to be published).Google Scholar
22.
Osgood, R.M., Ehrlich, D.J., Deutsch, T.F., Silversmith, D., and Sanchez, A., SPIE, 385, 112 (1983).Google Scholar
24.
McWilliams, B.M., Herman, I.P., Mitlitsky, F., Hyde, R.A., and Wood, L.L., Appl. Phys. Lett.
43, 946 (1983).Google Scholar
25.
Williams, B.M. Mc, Chin, H.W., Herman, I.P., Hyde, R.A., Mitlitsky, F., Whitehead, J.C., and Wood, L.L., SPIE, 459, 49 (1984).Google Scholar
26.
Tsao, J.Y., Ehrlich, D.J., Silversmith, D.J., and Mountain, R.W., IEEE Electron Device Letter EDL-3, 164 (1982).Google Scholar
27.
Carcouris, T., Krchnavek, R.R., Gilgen, H.H., Osgood, R.M., Kulick, S., and Schoen, J., Extended Abstracts, IEDM, Washington D.C. (1985).Google Scholar
28.
Black, J.G., Ehrlich, D.J., Sedaleck, J.H., Feinerman, A.D., and Busta, H.H., IEEE Electron Device Lett. EDL-7, A22, (1987).Google Scholar
30. See, for example, Tuckerman, D.B. and Weisberg, A.H., IEEE Electron Device Lett. EDL-7, 1 (1986).Google Scholar
31.
Introduction in Laser Diagnostics and Photochemical Processing for Semiconductor Devices, Osgood, R.M., Brueck, S.R.J., and Schlossberg, H.R. (eds.), North Holland: New York (1983).Google Scholar