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An Improvement of the Doerner-Nix Function for Substrate Effects in Ultrathin Films

Published online by Cambridge University Press:  01 February 2011

BO Zhou  and
Barton C Prorok
BO Zhou
Affiliation:
[email protected], Auburn University, Materials Engineering, 275 Wilmore Lab, Auburn, AL, 36849-5341, United States, 334-844-4733
Barton C Prorok
Affiliation:
[email protected], Auburn University, Auburn, AL, 36849-5341, United States
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Abstract

Substrate effects continue to be the key issue in interrogating thin films by nanoindentation. In this study, we studies amorphous thin films of several different materials deposited onto a silicon wafer. These materials span from being considerable softer than the substrate to films significantly harder than the substrate. The thin film Young's modulus Ef was measured with a MTS Nanoindenter XP system using the continuous stiffness measurement (CSM). The so-called “flat region” was observed in the early stage of nearly every CSM modulus-displacement curve for all materials studied. The depth of this region (hcr) was found to vary with the material. Based on the experimental data, we were able to modify the Doerner & Nix model for thin film indentation on a substrate, particularly their parameter alpha (α). The modified relation was found to be adept at closely matching all experimental data collected, which spanned both soft films on hard substrates and hard films on soft substrates.

Keywords

elastic propertiesthin filmamorphous
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1086: Symposium U – Mechanics of Nanoscale Materials , 2008 , 1086-U05-08
Copyright
Copyright © Materials Research Society 2008

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