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An Autonomous and Intelligent System Using Mobile-Agent Software to Model the Calculation Processes of Film Deposition Simulators

Published online by Cambridge University Press:  01 February 2011

Takahiro Takahashi ,
Noriyuki Fukui ,
Masamoto Arakawa ,
Kimito Funatsu  and
Yoshinori Ema
Takahiro Takahashi
Affiliation:
[email protected], Shizuoka University, Department of Electrical and Electronic Engineering, 3-5-1 Johoku, Naka-ku, Hamamatsu, 4328561, Japan
Noriyuki Fukui
Affiliation:
[email protected], Shizuoka University, Department of Electrical and Electronic Engineering, Faculty of Engineering, 3-5-1 Johoku, Naka-ku, Hamamatsu, 4328561, Japan
Masamoto Arakawa
Affiliation:
[email protected], The University of Tokyo, Department of Chemical System Engineering, School of Engineering, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 1138656, Japan
Kimito Funatsu
Affiliation:
[email protected], The University of Tokyo, Department of Chemical System Engineering, School of Engineering, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 1138656, Japan
Yoshinori Ema
Affiliation:
[email protected], Shizuoka University, Department of Electrical and Electronic Engineering, Faculty of Engineering, 3-5-1 Johoku, Naka-ku, Hamamatsu, 4328561, Japan
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Abstract

We developed an autonomous modeling system for the calculation processes of the simulator for film deposition processes in order to decrease the calculation cost for reproducing experimental results. Replacing the simulator with the mathematical models proposed by the modeling system decreased huge calculation cost of the simulator. The system consists of one mobile agent and three platforms for the agent. The agent autonomously moved in the computer-networks and operated the process simulator in the platform in order to make training data needed for modeling and then operated the generalized modeling software in the platform using the training data and finally the agent created the models. The models showed both good reproducibility and predictability with the calculated results of the simulator.

Keywords

chemical vapor deposition (CVD) (deposition)simulationcombinatorial synthesis
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1024: Symposium A – Combinatorial Methods for High-Throughput Materials Science , 2007 , 1024-A06-05
Copyright
Copyright © Materials Research Society 2008

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