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Amorphous Soft Magnetic Material Formation by Ion Mixing

Published online by Cambridge University Press:  25 February 2011

P. Gerard ,
G. Suran ,
B. Blanchard ,
J. Devenyi ,
M. Dupuy  and
P. Martin
P. Gerard
Affiliation:
L.E.T.I-C.E.A. 85 X, 38041 Grenoble (F),
G. Suran
Affiliation:
Laboratoire de Magnétisme C.N.R.S. (92195) Meudon Principal CEDEX
B. Blanchard
Affiliation:
DERDCA-CEA 85 X, 38041 Grenoble (F)
J. Devenyi
Affiliation:
LEPES-C.N.R.S. 166 X, 38041 Grenoble (F)
M. Dupuy
Affiliation:
LEPES-C.N.R.S. 166 X, 38041 Grenoble (F)
P. Martin
Affiliation:
L.E.T.I-C.E.A. 85 X, 38041 Grenoble (F),
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Abstract

Ion mixing of FeNi-Si multilayers is performed at the same dose of 3.1015 Xe+ cm−2 with either of the three energies 200, 300 or 400 keV. The irradiation is done at liquid nitrogen temperature (LNT) or at room temperature (RT). The mixed layers are characterized by reflection high energy electron diffraction (RHEED), transmission electron microscopy (TEM), Rutherford backscattering (RBS), secondary ion mass spectroscopy (SIMS) and ferromagnetic resonance (FMR). Films made at 400 keV are more reproducible and as homogeneous as the best amorphous films realized up to now, using sputtering techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 175
Copyright
Copyright © Materials Research Society 1984

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References

REFERENCES

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