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Amorphous Cu-Zr and Fe-Ti Compositionally Modulated Films Produced by Sputtering from Elemental Targets

Published online by Cambridge University Press:  25 February 2011

E. Chason
Affiliation:
Japan Research and Development Corporation, Gakushuin University Division, 1–5–1, Mejiro, Toshimaku, Tokyo 171, Japan
H. Kondo
Affiliation:
Japan Research and Development Corporation, Gakushuin University Division, 1–5–1, Mejiro, Toshimaku, Tokyo 171, Japan
T. Mizoguchi
Affiliation:
Japan Research and Development Corporation, Gakushuin University Division, 1–5–1, Mejiro, Toshimaku, Tokyo 171, Japan
R.C. Cammarata
Affiliation:
Division of Applied Sciences, Harvard University, Cambridge, MA 02138, U.S.A.
F. Spaepen
Affiliation:
Division of Applied Sciences, Harvard University, Cambridge, MA 02138, U.S.A.
B. Window
Affiliation:
CSIRO National Measurement Lab., Division of Applied Physics, P.O. Box 218, Lindfield, NSW 2070, Australia
J.B. Dunlop
Affiliation:
CSIRO National Measurement Lab., Division of Applied Physics, P.O. Box 218, Lindfield, NSW 2070, Australia
R.K. Day
Affiliation:
CSIRO National Measurement Lab., Division of Applied Physics, P.O. Box 218, Lindfield, NSW 2070, Australia
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Abstract

Amorphous compositionally modulated films of Cu-Zr and Fe-Ti have been prepared by sequential sputter deposition of the elemental metals. For Cu-Zr, a critical modulation amplitude has been found, below which the samples are entirely amorphous. The effective interdiffusion coefficient during deposition has been estimated, and found to be assisted by the free energy of mixing and the ion bombardment. X-ray studies of the modulation peaks, using grid scans, reveal a sharp mosaic, and asymmetrical peaks in some samples.

Type
Research Article
Copyright
Copyright © Materials Research Society 1986

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References

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