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Aerosol Deposition and Film Formation using Silicon Powder

Published online by Cambridge University Press:  28 February 2011

Kamesh V. Gadepally ,
K. B. Tennal ,
R. M. Hawk  and
W. D. Brown
Kamesh V. Gadepally
Affiliation:
University of Arkansas at Little Rock, Department of Electronics and Instrumentation, 2801 S. University, Little Rock, AR 72204
K. B. Tennal
Affiliation:
University of Arkansas at Little Rock, Department of Electronics and Instrumentation, 2801 S. University, Little Rock, AR 72204
R. M. Hawk
Affiliation:
University of Arkansas at Little Rock, Department of Electronics and Instrumentation, 2801 S. University, Little Rock, AR 72204
W. D. Brown
Affiliation:
University of Arkansas, Electrical Engineering Dept., Fayettevllle, AR 72701
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Abstract

An electrostatic deposition process which utilizes charged particle motion in an electric field has been successfully developed as a method for depositing coatings of silicon films. Coatings have been deposited on conducting, Insulating, and semiconducting surfaces after making suitable changes in deposition parameters. This process along with parameters Important to the deposition process which Include particle charge and size characteristics are discussed. These coatings are subsequently heat treated. Experimental results for depositions on silicon substrates are presented. Characterization in terms of chemical, electrical and physical properties of the film are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 206: Symposium G – Clusters and Cluster-Assembled Materials , 1990 , 91
Copyright
Copyright © Materials Research Society 1991

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References

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