Hostname: page-component-cd9895bd7-hc48f Total loading time: 0 Render date: 2024-12-27T02:00:34.247Z Has data issue: false hasContentIssue false

Adsorption of water molecules on the surface of photo-catalyst: a first principles theoretical comparison between InVO4 and rutile TiO2

Published online by Cambridge University Press:  11 February 2011

M. Oshikiri
Affiliation:
Nanomaterials Laboratory, National Institute for Materials Science, 3–13 Sakura, Tsukuba, Ibaraki 305–0003, Japan
M. Boero
Affiliation:
Institute of Physics, University of Tsukuba, 1–1–1 Tennodai, Tsukuba, Ibaraki 305–8571, Japan
J. Ye
Affiliation:
Materials Engineering Laboratory, National Institute for Materials Science, 1–2–1 Sengen, Tsukuba, Ibaraki 305–0047, Japan
Get access

Abstract

The adsorption process of water molecules on the surface of InVO4 has been investigated via first principles molecular dynamics simulations and compared with that of the well-known rutile TiO2. We have found that the surface of InVO4 shows a remarked chemical reactivity whenever comes in contact with water and H2O molecules are often adsorbed dissociatively on its surface. The reaction proceeds spontaneously in a way similar to the case of TiO2 and does not require the overcoming of an activation energy barrier. The peculiar atomic connectivity of the InVO4 bulk crystal structure and the changes at the catalyst surface induced by the water adsorption are discussed and compared with the TiO2 system.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Ye, J., Zou, Z., Oshikiri, M., Matsusita, A., Shimoda, M. Imai, M. and Shishido, T., Chem. Phys. Lett. 356, 221 (2002);Google Scholar
Ye, J., Zou, Z., Arakawa, H., Oshikiri, M., Shimoda, M., Matsusita, A., Shishido, T., Journal of Photochemistry A: Chemistry 148, 79 (2002).Google Scholar
2. Zou, Z., Ye, J., Sayama, K. and Arakawa, H., Nature 414, 625 (2001).Google Scholar
3. Zou, Z., Ye, J. and Arakawa, H. Chem. Phys. Lett. 332, 271 (2000).Google Scholar
4. Kudo, A., Ueda, K., Kato, H. and Mikami, I., Catalysis Lett. 53, 229 (1998);Google Scholar
Kudo, A., Omori, K. and Kato, H., J. Am. Chem. Soc. 121, 11459 (1999)Google Scholar
5. Oshikiri, M., Boero, M., Ye, J., Zou, Z. and Kido, G., J. Chem. Phys. 117, 7313 (2002)Google Scholar
6. Oshikiri, M., Seitsonen, A. P., Parrinello, M., Boero, M., Ye, J. and Zou, Z., MRS Spring meeting 2002, Mat. Res. Soc. Symp. Proc. V5.8 in press.Google Scholar
7. Oshikiri, M., Aryasetiawan, F. and Boero, M., Mat. Res. Soc. Symp. Proc. 654, AA5.10.1 (2001)Google Scholar
8. Oshikiri, M., Boero, M., Ye, J., Seitsonen, A. P., the proceedings of the 26 th International Conference on the Physics of Semiconductors (2002) in press.Google Scholar
9. Car, R. and Parrinello, M., Phys. Rev. Lett. 55, 2471 (1985);Google Scholar
CPMD code by Hutter, J. et al., Max-Planck-Institut für Festkörperforschung and IBM Zurich Research Laboratory, 19951999 Google Scholar
10. Becke, A. D.: Phys. Rev. A 38, 3098 (1988);Google Scholar
Lee, C., Yang, W. and Parr, R. G.: Phys. Rev. B 37, 785 (1988)Google Scholar
11. Troullier, N. and Martins, J. L., Phys. Rev. B 43, 1993 (1982).Google Scholar
12. Kudo, A., J. Ceramic Soc. Japan, 109, S81 (2001).Google Scholar
13. For example, Cromer, D. T. and Herrington, K., J. Am. Ceram. Soc., 77, 4708 (1955);Google Scholar
Kim, D-W., Enomoto, N., Nakagawa, Z. and Kawamura, K., J. Am. Ceram. Soc. 79, 1095 (1996);Google Scholar
Blanchin, M. G., Vicario, E. and Ploc, R. A., J. Appl. Crystallogr. 10, 228 (1977).Google Scholar
14. Touboul, P. M. and Toledano, P., Acta Cryst. B36, 240 (1980).Google Scholar
15. Hutter, J., Lüthi, H. P. and Parrinello, M., Comput. Mat. Sci. 2 244 (1994);Google Scholar
Császár, P. and Pulay, P., J. Mol. Struct. 114 31 (1984).Google Scholar
16. Boero, M., Terakura, K., Ikeshoji, T., Liew, C. C. and Parrinello, M., Phys. Rev. Lett. 85 3245 (2000).Google Scholar