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Adhesion of Silver Films to Ion-Bombarded Alumina**

Published online by Cambridge University Press:  25 February 2011

R. A. Erck  and
F. R. Fenske
R. A. Erck
Affiliation:
Materials and Components Technology Division, Argonne National Laboratory, Argonne, IL 60439
F. R. Fenske
Affiliation:
Materials and Components Technology Division, Argonne National Laboratory, Argonne, IL 60439
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Abstract

Silver films were deposited on alumina substrates using ion bombardment. Adhesion strength was measured as a function of deposition conditions, sputter-cleaning time, and bombarding ion species, using a pull-type adhesion tester. Argon- and argon/oxygen-ion sputtering produced large increases in adhesion strength, with the greatest increases occurring for oxygen-ion bombardment. Adhesion strength increased monotonically as a function of ion sputtering time. At a given deposition rate, further enhancement of adhesion is seen with concurrent ion bombardment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 85
Copyright
Copyright © Materials Research Society 1990

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Footnotes

**

Work supported by the U.S. Department of Energy, Energy Conversion and Utilization Technologies Division, under Contract W-31-109-Eng-38.

References

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