Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-29T09:40:01.206Z Has data issue: false hasContentIssue false

X-Ray-Optical Multilayer Structures Studied Using High Resolution Electron Microscopy.

Published online by Cambridge University Press:  26 February 2011

Mary Beth Stearns
Affiliation:
Dept. of Physics, Arizona State University, Tempe, AZ 85287, USA.
Amanda K. Petford-Long
Affiliation:
Center for Solid State Science, Arizona State University, Tempe, AZ 85287, USA.
C.-H. Chang
Affiliation:
University of California, Lawrence Livermore National Laboratory, Livermore, CA 94550, USA.
D. G. Stearns
Affiliation:
Dept. of Physics, Arizona State University, Tempe, AZ 85287, USA.
N. M. Ceglio
Affiliation:
University of California, Lawrence Livermore National Laboratory, Livermore, CA 94550, USA.
A. M. Havryluk
Affiliation:
University of California, Lawrence Livermore National Laboratory, Livermore, CA 94550, USA.
Get access

Abstract

The technique of high resolution electron microscopy has been used to examine the structure of several multilayer systems (MLS) on an atomic scale. Mo/Si multilayers, in use in a number of x-ray optical element applications, and Mo/Si multilayers, of interest because of their magnetic properties, have been imaged in cross-section. Layer thicknesses, flatness and smoothness have been analysed: the layer width can vary by up to 0.6nm from the average value, and the layer flatness depends on the quality of the substrate surface for amorphous MLS, and on the details of the crystalline growth for the crystalline materials. The degree of crystallinity and the crystal orientation within the layers have also been investigated. In both cases, the high-Z layers are predominantly crystalline and the Si layers appear amorphous. Amorphous interfacial regions are visible between the Mo and Si layers, and crystalline cobalt suicide interfacial regions between the Co and Si layers. Using the structural measurements obtained from the HREM results, theoretical x-ray reflectivity behaviour has been calculated. It fits the experimental data very well.

Type
Articles
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. References in “Applications of Thin-Film Multilayers to Figured X-Ray Optics” (ed. Marshall, G.F., Soc. Photo-Optical Instrumentation Engineers, 1985) 563.Google Scholar
2. Ceglio, N.M., Steams, D.G. and Hawryluk, A.M., J. de Physique, 1986 (in press).Google Scholar
3. Steams, D.G., Ceglio, N.M., Hawryluk, A.M., Steams, M.B., Petford-Long, A.K., Chang, C.-H., Danzmann, K., Kuhne, M., Muller, P. and Wende, B., Proc. of SPIE Conf. on “Multilayer Structures and Laboratory X-ray Laser Research” (1986).Google Scholar
4. Petford-Long, A.K., Steams, M.B., Chang, C.-H., Nutt, S.R., Steams, D.G., Ceglio, N.M. and Hawryluk, A.M., J. Appl. Phys., 1986 (in press).Google Scholar
5. Hansen, M. and Anderko, K., “Constitution of binary alloys” (McGraw-Hill Book Co., Inc., New York, 1958).Google Scholar