Hostname: page-component-78c5997874-g7gxr Total loading time: 0 Render date: 2024-11-02T16:48:38.179Z Has data issue: false hasContentIssue false

X-Ray Spectroscopic Studies of Organo-Metallic Vapor Phase Epitaxial Growth

Published online by Cambridge University Press:  15 February 2011

S. Brennant
Affiliation:
Stanford Synchrotron Radiation Laboratory, SLAC, Stanford, CA 94309
P. H. Fuosst
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
D. W. Kisker
Affiliation:
IBM Research Division, Yorktown Heights, NY 10598
F. J. Lamelast
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
P. Imperatori
Affiliation:
CNR-ITSE, Area Della Ricerca Di Roma, 00016 Monterotondo Staz, ITALY
G. B. Stephenson
Affiliation:
IBM Research Division, Yorktown Heights, NY 10598
Get access

Abstract

Chemical Vapor Deposition often occurs under conditions unsuitable for simultaneous monitoring using electron-based structural probes. This is due to the near-atmospheric pressure which exists during growth. While some work has been performed using optical probes, the typically high temperatures in the reactor vessel and the vastly longer wavelength of visible light versus the features being studied has hampered its utility as a structural probe. Over the past several years x-rays from synchrotron storage rings have been used to study the surface structure of growing materials. These studies have been primarily scattering studies. In this paper we explore the use of x-ray spectroscopic studies for the analysis of film growth. We have focused on three areas: the measurement of reactor vessel profiles using x-ray fluorescence; The measurement of gas-phase Extended X-ray Absorption Fine Structure (EXAFS), and the measurement of EXAFS of adsorbed species on the substrates.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Kobayashi, N. and Horikoshi, Y., Japan J. Appl. Phys. 30, 319 (1991).CrossRefGoogle Scholar
2. Maracas, G., Edwards, J., Shiralagi, K., Choi, K., Droopad, R., Johs, B., and Woolham, J., J. Vac. Sci. Technol. A 10, 1832 (1992).CrossRefGoogle Scholar
3. Epler, J., Jung, T., and Schweizer, H., Appl. Phys. Lett. 62, 143 (1993).Google Scholar
4. Aspnes, D., Harbison, J., Studna, A., and Florez, L., Phys. Rev. Lett. 59, 1687 (1988).CrossRefGoogle Scholar
5. Kisker, D., Fuoss, P., Tokuda, K., Renaud, G., Brennan, S., and Kahn, J., Appl. Phys. Lett. 56, 2025 (1990).CrossRefGoogle Scholar
6. Lamelas, F., Fuoss, P., Imperatori, P., Kisker, D., Stephenson, G., and Brennan, S., Appl. Phys. Lett. 60, 2610 (1992).Google Scholar
7. Fuoss, P., Kisker, D., Lamelas, F., Stephenson, G., Imperatori, P., and Brennan, S., Phys. Rev. Lett. 69, 2791 (1992).CrossRefGoogle Scholar
8. Kisker, D., Stephenson, G., Fuoss, P., Lamelas, F., Brennan, S., and Imperatori, P., J. Cryst Growth 124, 1 (1992).CrossRefGoogle Scholar
9. Brennan, S., Fuoss, P., Kahn, J., and Kisker, D., Nucl. Instrum. and Methods A 291, 86 (1990).CrossRefGoogle Scholar
10. Lytle, F., Greegor, R., Sandstrom, D., Marques, E., Wong, J., Spiro, C., Huffman, G., and Huggins, P., Nucl. Instrum. and Methods 226, 542 (1984).Google Scholar
11. Azaroff, L., Rev. Mod. Phys. 35, 1012 (1963).Google Scholar
12. Winick, H. and Doniach, S., editors, Synchrotron Radiation Research, Plenum Press, New York NY, 1980.Google Scholar
13. Koch, E.-E., editor, Handbook on Synchrotron Radiation, North-Holland, Amsterdam, 1983.Google Scholar
14. Plechaty, E., Cullen, D., and Howerton, R., Photon Interaction Cross-sections, Technical Report UCRL-50400, Vol.6, Rev. 3, Lawrence Livermore National Laboratory, 1981.Google Scholar
15. Konigsberger, D. and Prins, R., editors, Principles, Applications, Techniques of EXAFS, SEXAFS, and XANES, volume 92, John Wiley and Sons, New York NY, first edition, 1988.Google Scholar
16. Rehr, J., de Leon, J. M., Zabinsky, S., and Albers, R., J. Am. Chem. Soc. 113, 5136 (1991).CrossRefGoogle Scholar
17. Jensen, K., Fotiadis, D., and Mountziaris, T., J. Cryst Growth 107, 1 (1991).CrossRefGoogle Scholar