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Wafer-Scale Laser Lithography: I. Pyrolytic Deposition Of Metal Microstructures*

Published online by Cambridge University Press:  15 February 2011

Irving P. Herman ,
Roderick A. Hyde ,
Bruce M. Mcwilliams ,
Andrew H. Weisberg  and
Lowell L. Wood.
Irving P. Herman
Affiliation:
Physics Department, Lawrence Livermore National Laboratory, P.O. Box 808-L-278, Livermore, CA 94550
Roderick A. Hyde
Affiliation:
Physics Department, Lawrence Livermore National Laboratory, P.O. Box 808-L-278, Livermore, CA 94550
Bruce M. Mcwilliams
Affiliation:
Physics Department, Lawrence Livermore National Laboratory, P.O. Box 808-L-278, Livermore, CA 94550
Andrew H. Weisberg
Affiliation:
Physics Department, Lawrence Livermore National Laboratory, P.O. Box 808-L-278, Livermore, CA 94550
Lowell L. Wood.
Affiliation:
Physics Department, Lawrence Livermore National Laboratory, P.O. Box 808-L-278, Livermore, CA 94550
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Abstract

Mechanisms for laser-driven pyrolytic deposition of micron-scale metal structures on crystalline silicon have been studied. Models have been developed to predict temporal and spatial properties of laser-induced pyrolytic deposition processes. An argon ion laser-based apparatus has been used to deposit metal by pyrolytic decomposition of metal alkyl and carbonyl compounds, in order to evaluate the models. These results of these studies are discussed, along with their implications for the high-speed creation of micron-scale metal structures in ULSI systems.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 17: Symposium I – Laser Diagnostics and Photochemical Processing for Semiconductor Devices , 1982 , 9
Copyright
Copyright © Materials Research Society 1983

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Footnotes

*

Work performed under the auspices of the U.S.Department of Energy by the Lawrence Livermore National Laboratory under contract number W-7405-ENG-48.

References

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