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Wafer Curvature and Flatness Measurements Using The Magicmirror (Makyoh) Method

Published online by Cambridge University Press:  15 February 2011

J. SzabÓ ,
Ferenc Riesz  and
B. SzentpÁli
J. SzabÓ
Affiliation:
Research Institute for Technical Physics of the Hungarian Academy of Sciences, P. O. Box 76, H-1325 Budapest, Hungary
B. SzentpÁli
Affiliation:
Research Institute for Technical Physics of the Hungarian Academy of Sciences, P. O. Box 76, H-1325 Budapest, Hungary
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Abstract

A new method is presented for the measurement of the radii of curvature R of semiconductor wafers using the magic-mirror (Makyoh) technique. A flat mirror is placed beneath the sample, thus a second, “contour” image of the sample is formed beside the Makyoh image. From the ratio of the two image sizes, R can be determined using a set of reference curved mirrors. Model calculations show good agreement with the results. Other examples of assessing of the flatness of semiconductor samples are presented as well.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 379: Symposium C – Strained Layer Epitaxy–Materials, Processing, and Devise Applications , 1995 , 103
Copyright
Copyright © Materials Research Society 1995

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References

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