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Visualization of Atmospheric Pressure Chemical Vapor Deposition and Powder Spray Pyrolysis by Laser Light Scattering

Published online by Cambridge University Press:  15 February 2011

Limin Mao ,
Ogie Stewart ,
Gene P. Reck  and
James W. Proscia
Limin Mao
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
Ogie Stewart
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
Gene P. Reck
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
James W. Proscia
Affiliation:
Ford Motor Company, Glass Division, Dearborn, MI 48120
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Abstract

Atmospheric Pressure Chemical Vapor Deposition (APCVD) and powder spray pyrolysis are both pyrolytic thin film deposition techniques that are used to coat glass with thin films at atmospheric pressure. In the present study, the fluid dynamics of each process was investigated by laser light scattering. For each system, a 193 nm ArF excimer laser pulsed at 7 Hz was used for the analysis. In the case of the APCVD reactor, the difference in Rayleigh scattering between helium injected in the reactor and ambient air was used to characterize the process. For the powder spray process, laser scattering off the sprayed powder was used. The effect of various parameters is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 51
Copyright
Copyright © Materials Research Society 1995

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References

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