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Vaporization Chemistry of Organoaluminum Precursors to Ain

Published online by Cambridge University Press:  22 February 2011

Paul D. Crocco ,
John B. Hudson ,
Yi Wang  and
Leonard V. Interrante
Paul D. Crocco
Affiliation:
Materials Engineering Department and Chemistry Department, Rensselaer Polytechnic Institute, Troy, NY 12180
John B. Hudson
Affiliation:
Materials Engineering Department and Chemistry Department, Rensselaer Polytechnic Institute, Troy, NY 12180
Yi Wang
Affiliation:
Chemistry Department, Rensselaer Polytechnic Institute, Troy, NY 12180
Leonard V. Interrante
Affiliation:
Chemistry Department, Rensselaer Polytechnic Institute, Troy, NY 12180
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Abstract

We have used the technique of molecular beam mass spectrometry, with time of flight measurement, to study the vaporization of two organoaluminum precursors to AIN. The compounds studied were the isomers (CH3)3Al·NH3 (I) and (CH3)3N·AIH3 (II). Compound I was synthesized in house by reaction of (CH3)3Al with NH3. Compound II was obtained commercially. Mass spectrometric measurements of Compound I indicated a room temperature vapor pressure below 1 Torr, and slow decomposition at room temperature to yield CH4 and a solid product, identified as the trimer, [(CH3)2AlNH2]3, as well as possible concentrations of the corresponding monomer and dimer. Similar measurements on Compound II indicated partial decomposition to metallic aluminum and gaseous trimethylamine and hydrogen.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 335
Copyright
Copyright © Materials Research Society 1994

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References

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