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UV-Laser Photoablation Of Thermostable Polymers: Polyimides, Polyphenylquinoxaline and Teflon AF
Published online by Cambridge University Press: 15 February 2011
Abstract
The UV laser ablation of three thermostable polymers, polyimide, polyphenylquinoxaline and Teflon AF of interest for microelectronics is presented. Direct absorption of the laser beam is not possible by Teflon, but a doping technique is described.
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- Copyright © Materials Research Society 1991
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