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Using Zeolites as Substrates for Diamond Thin Film Deposition

Published online by Cambridge University Press:  15 February 2011

Michael C. Kwan
Affiliation:
Massachusetts Institute of Technology, Department of Chemical Engineering, 66–462, Cambridge, MA, 02139
Karen K. Gleason
Affiliation:
Massachusetts Institute of Technology, Department of Chemical Engineering, 66–462, Cambridge, MA, 02139
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Abstract

Zeolites have been used as a potential substrate for CVD diamond deposition. By saturating the pore channels of a silicalite crystal, which are spaced approximately 10 Å apart, with hydrocarbon seeds to induce and control nucleation, films have been grown in a hot filament chemical vapor deposition (HFCVD) system under standard deposition conditions, using acetone as the carbon source. The hydrocarbons used were adamantane, naphthalene, anthracene, 2,3-benzanthracene, and l,2:5,6-dibenzanthracene. To enhance nucleation, a high pressure pre-deposition period was used initially.

Characterization of these films through electron diffraction and Auger electron spectroscopy indicates that polycrystalline β-SiC imbedded in an amorphous matrix is initially formed and large, well faceted diamond crystals are subsequently nucleated.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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