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Using Molecular-Beam Mass Spectrometry to Study the Pecvd of Diamondlike Carbon Films

Published online by Cambridge University Press:  22 February 2011

I.B. Graff ,
R.A. Pugliese Jr.  and
P.R. Westmoreland
I.B. Graff
Affiliation:
Department of Chemical Engineering, University of Massachusetts, 159 Goessmann Laboratory, Amherst, MA 01003-3110
P.R. Westmoreland
Affiliation:
Department of Chemical Engineering, University of Massachusetts, 159 Goessmann Laboratory, Amherst, MA 01003-3110
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Abstract

Molecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 129
Copyright
Copyright © Materials Research Society 1994

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