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Ultra Thin Indium Tin Oxide Films On Various Substrates By Pulsed Laser Deposition

Published online by Cambridge University Press:  10 February 2011

X. W. Sun ,
D. H. Kim  and
H. S. Kwok
X. W. Sun
Affiliation:
Department of Electrical & Electronic Engineering, Hong Kong University of Science & Technology, Clear Water Bay, Kowloon, Hong Kong
D. H. Kim
Affiliation:
LG Electronics, Seoul, Korea
H. S. Kwok
Affiliation:
Department of Electrical & Electronic Engineering, Hong Kong University of Science & Technology, Clear Water Bay, Kowloon, Hong Kong
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Abstract

Indium Tin Oxide (ITO) thin films with low resistivities of 0.1 ∼0.2 mΩ-cm were deposited on various substrates such as YSZ, glass, and ZnO buffered glass by pulsed laser deposition (PLD). The X-ray rocking curve of crystalline (200) ITO films grown on (100) YSZ had a FWHM as narrow as 0.08°. ITO films grown on ZnO (0001) buffered glass had an single (222) orientation and the X-ray rocking curve had a FWHM of 2. 1°. Ultrathin ITO films of 3.6nm were fabricated on YSZ and their electrical properties were measured from 10K-300K. ITO films fabricated on ZnO buffered glass and bare glass were characterized by Hall effect measurements as a function of temperature. The results indicate that the resistivity of ITO films grown by PLD does not depend on the orientation or the structure of the thin film. The resistivity is dominated by impurity scattering in the range of 10K-300K. We show that ZnO/glass is a good alternative to bare glass for producing commercial ITO films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 485: Symposium G – Thin Film Structures for Photovoltaics , 1997 , 267
Copyright
Copyright © Materials Research Society 1998

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