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Tribological Propertees of Carbon thin Films Prepared by Plasma-Free Sputtering Method

Published online by Cambridge University Press:  22 February 2011

T. Hirata  and
M. Naoe
T. Hirata
Affiliation:
Dept. of Physical Electronics, Tokyo Institute of Technology, 2–12–1, O-okayama, Meguro-ku, Tokyo 152, Japan
M. Naoe
Affiliation:
Dept. of Physical Electronics, Tokyo Institute of Technology, 2–12–1, O-okayama, Meguro-ku, Tokyo 152, Japan
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Abstract

Amorphous “Diamond-like” carbon films were deposited on plasma-free substrates at low temperature by the Facing Targets Sputtering (FTS) method. Tribological characteristics determined by tap, scratch and slide tests were much better than those for amorphous carbon films deposited by the conventional Magnetron Sputtering (MS) method. Consequently, these films deposited by the FTS method were surely useful for protective layers in rigid magnetic disk.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 239: Symposium D – Thin Films: Stresses and Mechanical Properties III , 1991 , 635
Copyright
Copyright © Materials Research Society 1992

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References

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