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Towards the Optimization of AMT Barrel Reactors for Silicon Epitaxy
Published online by Cambridge University Press: 10 February 2011
Abstract
In this work, the epitaxial silicon deposition by SiHCl3-hydrogen mixtures in a AMT 7700 barrel reactor was analyzed through a detailed model where a three dimensional flow dynamic was solved by reduction to a two dimensional geometry under cylindrical coordinates. The model was used to investigate the role of the reactor geometry and of the process parameters on the axial deposition uniformity. A comparison with industrial experimental data was also performed.
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- Copyright © Materials Research Society 1998