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Toward Growing III-V Clusters with Metalorganic Precursors

Published online by Cambridge University Press:  10 February 2011

A. Demchuk
Affiliation:
Department of Chemistry, Tulane University, New Orleans, LA 70118–5698
J. Porter
Affiliation:
Department of Chemistry, Tulane University, New Orleans, LA 70118–5698
B. Koplitz
Affiliation:
Department of Chemistry, Tulane University, New Orleans, LA 70118–5698
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Abstract

The present work reports on the formation of GaN-containing clusters from metalorganic precursors by combining pulsed laser photolysis and pulsed nozzle methods. Ammonia (NH3) and triethylgallium (C2H5)3Ga (TEG) or trimethylgallium (CH3)3Ga (TMG) with He, Ar, or N2 as the carrier gas are introduced into a high vacuum chamber via a specialized dual pulsed nozzle source. The light from an ArF excimer laser (193 nm, 23 ns FWHM) is focused into the mixing and reaction region of the nozzle source, and the products are then mass analyzed with a quadrupole mass spectrometer. Efficient laser-assisted growth of (GaN)x-containing clusters is shown with this technique.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Dupuis, R.D., Holmes, A.L., Gradowski, P.A., Fertitta, K.G., Ponce, F.A., Mat. Res. Soc. Symp. Proc. 395, 183 (1996).Google Scholar
2. Kouvetakis, J., McMurran, J., Beach, D.B., Smith, D.J., Mat. Res. Soc. Symp. Proc. 395, 79 (1996).Google Scholar
3. Coates, G.E., Green, M.L.H., Wade, K., Organometallic Compounds, V. I: The Main Group Elements: by Coates, G.E. and Wade, K., (Methuen & Co Ltd, London, 1967) p. 343.Google Scholar
4. Qureshi, I., Ajmera, P.K. and Felps, S., Mater. Letters 14, 107 (1992).Google Scholar
5. Organometallic Compounds of Aluminum, Gallium, Indium and Thallium. Ed. by McKillop, A., Smith, J.D. and Worral, I.J., (Chapman and Hall Ltd., New York, 1985) p. 113.Google Scholar
6. Okabe, H., Photochemistry of Small Molecules, (Wiley Inc., New York, 1978) pp. 269272.Google Scholar
7. Bauerle, D., Laser Processing and Chemistry, 2nd ed. (Springer-Verlag, Berlin, Heidelberg, New York, 1996), pp. 583587.Google Scholar
8. Ziegler, L., J. Chem. Phys. 82, 664 (1985).Google Scholar
9. Shinohara, H., J. Chem. Phys. 79, 1732 (1983).Google Scholar
10. Sato, A., Tanaka, Y., Tsunekawa, M., Kobayashi, M., Sato, H., J. Phys. Chem. 97, 8458 (1993).Google Scholar
11. Beuermann, Th. and Stuke, M., Appl. Phys. B 49, 145 (1989).Google Scholar
12. Zhang, Y., Beuermann, Th., and Stuke, M., Appl. Phys. B 48, 97 (1989).Google Scholar
13. Mitchell, S.A., Hackett, P.A., Rayner, D.M., Humphries, M.R., J. Chem. Phys. 83, 5028 (1985).Google Scholar
14. Mitchell, S.A., and Hackett, P.A., J. Chem. Phys. 79, 4815 (1983).Google Scholar
15. Almond, M.J., Jenkins, C.E., Rice, D.A., J. Organometallic Chem. 439, 251 (1992).Google Scholar
16. Almond, M.J., Drew, G.B., Jenkins, C.E., Rice, D.A., J. Chem. Soc. Dalton Trans. 1, 5 (1992).Google Scholar
17. Brum, J.L., Deshmukh, S., and Koplitz, B., J. Chem. Phys. 93, 7946 (1990).Google Scholar