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Time-Resolved Light-Emission Spectroscopy and Ion Current Measurements from Pulsed-Laser-Evaporated Cadmium Plumes

Published online by Cambridge University Press:  01 January 1992

Y. Rajakarunanayake ,
Y. Luo ,
A. Compaan  and
M.A. Tamor
Y. Rajakarunanayake
Affiliation:
Dept. of Physics and Astronomy, The Univ. of Toledo, Toledo, OH 43606
Y. Luo
Affiliation:
Dept. of Physics and Astronomy, The Univ. of Toledo, Toledo, OH 43606
A. Compaan
Affiliation:
Dept. of Physics and Astronomy, The Univ. of Toledo, Toledo, OH 43606
M.A. Tamor
Affiliation:
Research Staff, Ford Motor Co., Dearborn MI 48121–2053
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Abstract

We have investigated the pulsed laser evaporation of elemental Cd targets, with the aim of understanding the velocity distributions in the plumes and the changes which occur under moderate electrical bias. We report detailed kinetic energy distributions of the species in the laser evaporated plumes. In these experiments, frequency doubled, Q-switched pulses of a Nd:YAG laser were used at a 10 Hz repetition rate to generate the plumes. The velocity distributions of individual atomic species were determined by time-of-flight (TOF) light emission spectroscopy, while the time resolved ion/atom currents were measured with a collector above the target. We have simultaneously measured the dependence of the time resolved optical and electrical signals on the electrical bias applied between target and collector. We find that the typical kinetic energies in the plume are on the order of 10-200 eV, while the ionized species travel two to three times faster than the neutral particles. These results provide fundamental information about the physics of the pulsed laser evaporation process, and subsequent evolution of the plume.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 93
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1. Wu, X. D., Inam, A., Venkatesan, T., Chang, C. C., Chase, E. W., Barboux, P., Tarascon, J. M., and Wilkens, B., Appl. Phys. Lett. 52, 754 (1988); Dijkkamp, D., Venkatesan, T., Wu, X. D., Shaheen, S. A., Jisrawi, N., Min-lee, Y. H., McLean, W. L., and Croft, M., Appl. Phys. Lett. 51, 619 (1987).Google Scholar
2. Sankur, H. and Cheung, J. T., J. Vac. Sci. Technol. A1(4), 1807 (1983); Sankur, H., Nelson, J. G., Pritt, A. T., Gunning, W. J., J. Vac. Sci. Technol. A5(1), (1987).Google Scholar
3. Aydinli, A., Contreras Puente, G., Bhat, A., Compaan, A. and Chan, A., J. Vac. Sci. Technol. A9(6), 3031 (1991); Compaan, A., Bhat, A., Tabory, C., Liu, S., Nguyen, M., Aydinli, A., Tsien, L. H., and Bohn, R. G., Solar Cells 30, 79 (1991).Google Scholar
4. Dubowski, J. J., Roth, A. P., Wasilewski, Z. R., and Rolfe, S. J., Appl. Phys. Lett 59, 1591 (1991); Dubowski, J. J., Thompson, J. R., Rolfe, S. J. and McCaffrey, J. P., Superlatt. Microstruct. 9, 327 (1991); J. J. Dubowski, J. Cryst. Growth 101, 105 (1990).Google Scholar
5. Cheung, J. T. and Cheung, D. T., J. Vac. Sci. Technol. 21, 182 (1982).Google Scholar
6. Rajakarunanayake, Y., Luo, Y., Aydinli, A., Lavalle, N. and Compaan, A., to appear in Mat. Res. Soc. Symp. Proc. 268 (1992).Google Scholar
7. Namiki, A., Watabe, K., Fukano, H., Nishigaki, S., and Noda, T., J. Appl. Phys. 54(6), 3443 (1983);Google Scholar
8. Singh, R. K. and Narayan, J., Phys. Rev. B41(13), 8843 (1990).Google Scholar
9. Tomoda, S., Kusunoki, I., and Matsumoto, S., Mass Spectros. 23, 133 (1975).Google Scholar
10. Yao, T. in Atomic Layer Epitaxy, edited by Suntola, T., Chapman and Hall, New York, 1990, p 156.Google Scholar
11. Kelly, R. & Dreyfus, R.W., Surface Science 198, 263 (1988); Kelly, R., J. Chem Phys. 92, 5047 (1990).Google Scholar