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Temperature Dependence of the Growth and Saturation of Light-Induced Defects in a-Si:H
Published online by Cambridge University Press: 21 February 2011
Abstract
We report new experimental data on the light-soaking of a-Si:H with a Kr-ion laser at an optical generation rate G of at least 4×1021 to 3×1022 cm-3s1. We studied the temperature and intensity dependence of the saturation of the defect density and found that the saturation value of light-induced defects (Nsat) is insensitive to temperature and light intensity below about 90°C. Above 90°C Nsat drops with increasing temperature. This behavior can be explained within the defect pool model by a limited number of defect sites coupled with an annealing process.
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- Copyright © Materials Research Society 1991
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