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Tantalum Oxide and Niobium Oxide thin Films Grown by Pulsed Laser Deposition

Published online by Cambridge University Press:  15 February 2011

FÉlix E. FernÁndez  and
Pablo J. Marrero
FÉlix E. FernÁndez
Affiliation:
Department of Physics, University of Puerto Rico, Mayagüez, PR 00680
Pablo J. Marrero
Affiliation:
Department of Physics, University of Puerto Rico, Mayagüez, PR 00680
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Abstract

Amorphous tantalum pentoxide (Ta2O5) and niobium pentoxide (Nb2O5) thin films were grown from both metal and oxide target by reactive pulsed laser deposition. Film structure and composition were studied as a function of substrate temperature and oxygen pressure. Good quality transparent films were obtained for substrate temperatures greater than 140° C, and O2 pressures of 200 mTorr. Lower temperatures and pressures produced opaque films, associated with lower oxides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 205
Copyright
Copyright © Materials Research Society 1996

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References

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