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Synthesis of Crystalline Silicon Nanoparticles in Low-Pressure Inductive Plasmas

Published online by Cambridge University Press:  11 February 2011

Ameya Bapat ,
Uwe Kortshagen ,
Stephen A. Campbell ,
Christopher R. Perrey  and
C. Barry Carter
Ameya Bapat
Affiliation:
Department of Mechanical Engineering, University of Minnesota, Minneapolis, MN 55455
Uwe Kortshagen
Affiliation:
Department of Mechanical Engineering, University of Minnesota, Minneapolis, MN 55455
Stephen A. Campbell
Affiliation:
Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN 55455
Christopher R. Perrey
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
C. Barry Carter
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
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Abstract

Amorphous silicon has been used for a wide variety of electronic applications including thin film transistors and energy conversion devices. However, these devices suffer greatly from defect scattering and recombination. A method for depositing crystalline silicon would be highly desirable, especially if it can be remotely created and deposited on any kind of substrate. Our work aims at synthesis and deposition of mono-disperse, single crystal silicon nanoparticles, several tens of nm in diameter on varied substrates. Synthesis of nanocrystals of 2–10 nm diameter has been previously reported but larger particles were amorphous or polycrystalline. This work reports the use of an inductively coupled low-pressure plasma to produce nanocrystals with diameters between 20–80 nm. Electron microscopy studies confirm that the nanocrystals are highly oriented diamond-cubic silicon.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 737 , 2002 , F1.10
Copyright
Copyright © Materials Research Society 2003

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