Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-29T07:27:19.808Z Has data issue: false hasContentIssue false
  • English
  • Français

The Surface Structure of Oxides Studied with Reflected High Energy Electrons

Published online by Cambridge University Press:  15 February 2011

Tung Hsu
Tung Hsu*
Affiliation:
P.O. Box 58364, Salt Lake City, Utah 84158-0364, U.S.A.
Get access

Abstract

Reflected high energy electrons have been employed for studying surfaces of single crystal oxides in real and reciprocal space. The techniques used include reflection high energy electron diffraction (RHEED), reflection electron microscopy (REM), scanning reflection electron microscopy (SREM), and reflection electron energy loss spectroscopy (REELS). These methods have provided much information on surface morphology as well as the atomic and electronic structure of MgO, ∝-Al2O3, ∝ -Fe2O3, SiO2, TiO2 (rutile), and ZnO single crystals. Analyses for chemical composition and electronic states are possible using SREM and REELS. Surfaces terminating at different atomic layers of large-unit-cell materials have been determined in REM images and also in REELS data obtained under REM and SREM. Surface modification due to bombardment with the incident electron beam is pronounced on some oxide surfaces. These processes have been investigated with the REM imaging and REELS techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 295: Symposium W – Atomic-Scale Imaging of Surfaces and Interfaces , 1992 , 271
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Ruska, E., Physik, Z., 83: 492 (1933).CrossRefGoogle Scholar
2. Beauvillian, J., Claverie, A., and Jouffrey, B., J. Crystal Growth, 64, 549 (1983).Google Scholar
3. Kahata, H. and Yagi, K., Surface Sci., 220, 131 (1989).Google Scholar
4. Shimizu, N., Tanishiro, Y., Kobayashi, K., Tagayanki, K., and Yagi, K., Utramicroscopy, 18, 453 (1985).Google Scholar
5. Uchida, Y. and Lehmpfuhl, G. and Imbihl, R., Surface Sci., 234, 27 (1990).Google Scholar
6. Wells, O.L., Boyde, A, Lifshin, E., and Resanowich, A, in “Scanning Electron Microscopy” (McGraw-Hill, New York, 1974) pp. 139–150, 60-179.Google Scholar
7. Hsu, T., Microscopy Research and Technique, 20, 318 (1992).CrossRefGoogle Scholar
8. Haine, M.E. and Hirst, W., British J. Appl. Phys., 4, 239 (1953).Google Scholar
9. Hsu, T. and Lehmpfuhl, G., Ultramicroscopy, 27, 359 (1989).Google Scholar
10. Hsu, T. and Nutt, S.R., in “Materials Problem Solving with the Transmission Electron Microscope”, eds. Hobbs, L. W., Westmacott, K. H., and Williams, D. B., Materials Research Society, pp. 387–394 (1986).Google Scholar
11. Hsu, T. and Kim, Y.T., Ultramicroscopy, 32, 103 (1990).Google Scholar
12. Yao, Nan and Cowley, John. M., Microscopy Research and Technique, 20,413 (1992).CrossRefGoogle Scholar
13. Peng, L.-M., Cowley, J.M., and Hsu, T., Micron and Microscopia Acta, 18.3, 179 (1987).CrossRefGoogle Scholar
14. Hsu, T. and Peng, L.-M., Ultramicroscopy, 22, 217 (1987).Google Scholar
15. Osakabe, N., Matsuda, T., Endo, J. and Tonomura, A., Jpn. J. Appl. Phys., 27, L1772 (1988).Google Scholar
16. Osakabe, N., Tanishiro, Y., Yagi, K., and Honjo, G., Surface Sci., 102, 424 (1981).Google Scholar
17. Peng, L.-M. and Cowley, J.M., Acta Cryst., A42, 545 (1986).Google Scholar
18. Osakabe, N., Microscopy Research and Technique, 20, 457 (1992).Google Scholar
19. Uchida, Y. and Lehmpfuhl, G., Ultramicroscopy, 23, 53 (1987).Google Scholar
20. Banzhof, H., Hermann, K.H., and Lichte, H., Microscopy Research and Technique, 20, 450 (1992).CrossRefGoogle Scholar
21. Hsu, T., Ultramicroscopy, 11,167 (1983).Google Scholar
22. Hsu, Tung and Cowley, J.M., Ultramicroscopy, 11, 239 (1983).Google Scholar
23. Hsu, T., Iijima, S., and Cowley, J.M., Surface Sci., 137, 551 (1984).Google Scholar
24. Osakabe, N., in Proceedings of the 5th Asia-Pacific Electron Microscopy Conference, Vol. 1, 78 (1992, Beijing).Google Scholar
25. Peng, L.-M., Colwey, J.M., and Hsu, T., Ultramicroscopy, 29, 135 (1989).Google Scholar
26. Kim, Y.T. and Hsu, T., Surface Sci., 258, 131 (1991).Google Scholar
27. Kim, Y.T. and Hsu, T., Surface Sci., 275, 339 (1992).Google Scholar
28. Antonik, M.D. and Lad, R.J., J. Vac. Sci. Technol. A10, 669 (1992).Google Scholar
29. Latyshev, A. V., Aseev, A. L., Krasilnikov, A.B., and Stenin, S.I., Surface Sci., 227, 24 (1990)Google Scholar
30. Wang, Z.L., Bentley, J., Kenik, E.A., Horton, L.L., and McKee, R.A., Surface Sci., 273, 88 (1992).Google Scholar
31 Wang, Z.L. and Bentley, J., in Mat. Res. Soc. Symp. Proc. Vol. 208, pp. 155–160 (1991).Google Scholar
32. Gajdardziska-Josifovska, M., Crozier, P.A. and Cowley, J.M., in “The Structure of Surfaces II”, Tong, S.Y., Hove, M. A. Van, Takayanagi, K., Xie, X.D., Eds., Springer-Verlag, Berlin, pp. 660–664 (1991).Google Scholar
33. Crozier, P.A., Gajdardziska-Josifovska, M. and Cowley, J.M., Microscopy Research and Technique, 20, 426 (1992).Google Scholar
34. Wang, Z.L., Materials Letters, 6.4, 105 (1988).Google Scholar
35. Liu, J. and Cowley, J.M., Ultramicroscopy, 37, 50 (1991).Google Scholar
36. Peng, L.-M. and Czernuzka, J.T., Philo. Mag., A.64, 533 (1991).Google Scholar
37. Peng, L.-M., Cowley, J.M., Micron and Microscopia Acta, 18.3, 171 (1987).Google Scholar
38. Peng, L.-M., Cowley, J.M., and Hsu, T., Micron and Microscopia Acta, 18.3, 179 (1987).Google Scholar
39. This quote, which may not be precise, comes from a MAS Annual Meeting. The author regrets not being able to give the exact reference.Google Scholar
40. Hsu, Tung and Kim, Yootaek, Surface Sci., 258,119 (1991).Google Scholar
41 Wang, L., Liu, J., and Cowley, J.M., in Proceeding of the 50th Annual Meeting of EMSA, pp. 1462–1463 (1992).Google Scholar
42. Gajdardziska-Josifovska, M., Crozier, P.A., and Cowley, J.M., Surface Sci. Lett., 248, L259 (1991).Google Scholar
43. Bursill, L.A., Lin, Peng Ju, and Smith, D.J., Ultramicroscopy 23, 223 (1987).Google Scholar
44. Bonevich, J. E. and Marks, L. D., Ultramicroscopy 35, 161 (1991).Google Scholar
45. Tomokiyo, Y., Kuroiwa, T., and Kinoshita, C., Ultramicroscopy 39, 213 (1991).Google Scholar
46. Koike, H., Kobayashi, K., Ozawa, S.-I., and Yagi, K., Jpn. J. Appl. Phys., 28, 861 (1989).Google Scholar
47. Wang, Z.L. and Bentley, J., Microscopy Research and Technique, 20, 390 (1992).Google Scholar
48. Peng, L.-M. and Czernuzka, J.T., Surface Sci., 243, 210 (1991).Google Scholar
49. Wang, Z.L. and Howie, A., Surface Science 226, 293 (1990).Google Scholar
50. Wang, Z.L., J. Microscopy, 163, 261 (1991).Google Scholar