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Surface Morphological Changes of Polyimide with Oxygen Reactive Ion Beam Etching (RIBE)

Published online by Cambridge University Press:  25 February 2011

Kyung W. Paik
Affiliation:
Department of Materials Science and Engineering, Cornell University, Bard Hall, Ithaca, NY 14853
Arthur L. Ruoff
Affiliation:
Department of Materials Science and Engineering, Cornell University, Bard Hall, Ithaca, NY 14853
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Abstract

At the beginning of etching, surface asperities appeared on the top plane of the polyimide (PI) film. The formation of surface asperities is due to the ordered phase in PI film. The known dimension of the ordered phase measured by X-ray diffraction is consistant with the size of surface asperities, 100 Å, observed by TEM. Further ion doses made these asperties evolve into smooth bumps which then eroded into cones as a result of etch yield difference as a function of the angle of beam incidence Y(θ)/Y(0) which has a maximum at θ=70. Finally cones led to the development of grass-likestructure on the top plane of the PI film. The formation of platelike structure on the cross-sectional plane of PI indicates that the structural inhomogeniety of the PI film(the ordered and disordered phase) is the main cause for the surface morphological changes of PI.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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References

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