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Surface Microstructural Evolution of Ultrathin films by Real time Spectroscopic Elupsometry

Published online by Cambridge University Press:  21 February 2011

R. W. Collins ,
Ilsinan An ,
Y. M. Li  and
C. R. Wroński
R. W. Collins
Affiliation:
The Pennsylvania State University, Department of Physics and Materials Research Laboratory, University Park, PA 16802.
Ilsinan An
Affiliation:
The Pennsylvania State University, Department of Physics and Materials Research Laboratory, University Park, PA 16802.
Y. M. Li
Affiliation:
The Pennsylvania State University, Department of Physics and Materials Research Laboratory, University Park, PA 16802.
C. R. Wroński
Affiliation:
The Pennsylvania State University, Department of Electrical and Computer Engineering, University Park, PA 16802.
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Abstract

Vapor deposition of smooth, microstructurally uniform amorphous films on dissimilar substrates requires coalescence of clusters that form during initial nucleation. We have developed techniques that provide sub-monolayer sensitivity to this phenomenon, relying on real time spectroscopie ellipsometry observations during ultrathin film growth (thicknesses < 50 Å). An investigation of tetrahedrally-bonded amorphous semiconductors lends insights into the role of nucleation density and adatom surface diffusion in determining the ultimate atomic-scale roughness on the film.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 237: Symposium Ca – Interface Dynamics and Growth , 1991 , 235
Copyright
Copyright © Materials Research Society 1992

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References

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