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Surface Diffusion: Atomistics and Surface Morphology (Summary of MRS Symposium B Panel Discussion)

Published online by Cambridge University Press:  25 February 2011

M. H. Grabow ,
P. J. Feibelman ,
G. H. Gilmer ,
B. H. Cooper  and
Y. W. Mo
M. H. Grabow
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
P. J. Feibelman
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
G. H. Gilmer
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
B. H. Cooper
Affiliation:
Laboratory of Atomic and Solid State Physics, Cornell University, Ithaca, NY 14853
Y. W. Mo
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598.
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Abstract

This paper gives some of the highlights of a panel discussion on surface diffusion held Monday, November 30, 1992 at the Fall MRS Meeting in Boston, Massachusetts. Four invited speakers discussed computer modeling techniques and scanning tunneling microscopy experiments that have been used to provide new understanding of the atomistic processes that occur at surfaces. We present a summary of each of the invited talks, indicate other presentations on surface diffusion in this proceedings, and provide a transcript of the two discussion sessions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 280: Symposium B – Evolution of Surface and Thin Film Microstructure , 1992 , 11
Copyright
Copyright © Materials Research Society 1993

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References

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