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Surface Characterization of DNA Microarray on Silicon Dioxide and Compatible Silicon Materials in the Immobilization Process

Published online by Cambridge University Press:  17 March 2011

Wen Xu
Affiliation:
Department of Electrical and Electronic Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
Jiong Li
Affiliation:
National Laboratory of Molecular and Biomolecular Electronics, Southeast University, Nanjing 210096, China
Mei Xue
Affiliation:
Department of Electrical and Electronic Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
Maria Carles
Affiliation:
Department of Biochemistry, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
Dieter Wilhelm Trau
Affiliation:
Department of Biochemistry, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
Ralf Lenigk
Affiliation:
Department of Biochemistry, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
Nikolaus J. Sucher
Affiliation:
Department of Biology, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
Nancy Y. Ip
Affiliation:
Department of Biochemistry, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
Mansun Chan
Affiliation:
Department of Electrical and Electronic Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
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Abstract

In this work, the surface properties of a DNA microarray formed on silicon based solid support are studied at different stages during the hybridization process. A modified immobilization process using the covalent immobilization of thiol-terminated DNA oligonucleotides on self-assembled layers of (3-mercaptopropyl) trimethoxysilane (MPTS) by disulfide bond formation is used to selectively attach DNA probes onto the surface of silicon dioxide. Contact angle measurement is used to monitor the bonding of MPTS on the surface. Atomic force microscopy (AFM) shows an increase in particle size before and after the growth of the MPTS layer. Fluorescence microscopy reveals the success of hybridization of complementary oligonucleotides labeled by FAM to the probe. The effects of modified immobilization process on other common material in silicon processing are also studied. As a result of the corrosive chemical used in the process, common metals used in micro-fabrication processes like aluminum are etched away. Silicon nitride is not affected by the immobilization and hybridization process, and thus can be used as a passivation and isolation material to conform the DNA to a specific area for DNA microarray to reduce cross-talk. The fluorescence image from the scanner indicates silicon nitride can effectively be used as an isolation material with linewidth down to 1 μm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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References

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