Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2024-12-27T01:57:59.044Z Has data issue: false hasContentIssue false

Surface Catalyzed Photo-Assisted Mocvd of Cobalt Thin Films for Enhanced Control of Magnetic Properties

Published online by Cambridge University Press:  10 February 2011

M.F. Chioncel
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
P.W. Haycock
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
F.Y. Ogrin
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
B.L. Ruthven
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
J.W. Bull
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
Get access

Abstract

Thin films of cobalt have been deposited by photo-assisted metal-organic chemical vapour deposition. Samples of thickness less than 60 nm, grown at 110 °C, exhibit inverse hysteresis when an external magnetic field is applied in a particular direction normal to the plane of the film. These films are a mixture of crystalline and, possibly, amorphous phases with a grain size of about 130 nm and a significant oxygen content throughout. The potential roles of the various physical characteristics, as well as that of the photolytic deposition process itself, in the origin of the inverse hysteresis are discussed, as is a possible self-limiting growth mechanism.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Gu, B.X. and Wang, H., J. Magn. Magn. Mater. 187, 47 (1998).10.1016/S0304-8853(97)01034-2Google Scholar
2 Alameda, J.M., Carmona, F., Salas, F.H., Prado, L.M. Alvarez, Morales, R. and Perez, G.T., J. Magn. Magn. Mater. 154, 249 (1996).10.1016/0304-8853(95)00577-3Google Scholar
3 Maruyama, T., Jap. J. of Appl. Phys. part 2 - letters 36, L705 (1997).10.1143/JJAP.36.L705Google Scholar
4 Ogrin, F.Y. and Haycock, P.W., J. Magn. Magn. Mater. 155, 199 (1996).10.1016/0304-8853(95)00738-5Google Scholar
5 Dormans, G.J.M., Meekes, G.J.B. and Staring, E.G.J., J. Cryst. Growth 114, 364 (1991).10.1016/0022-0248(91)90054-9Google Scholar
6 Gross, M.E. and Schnoes, K.J. in Proc. 10th Intern. Conf On Chemical Vapor Deposition (Electrochem. Soc., Pennington., NJ, 1987) p. 759.Google Scholar
7 Lane, P.A., Oliver, P.E., Wright, P.J., Reeves, C.L., Pitt, A.D. and Cockayne, B., Chem. Vap. Dep. 4, 183 (1998).10.1002/(SICI)1521-3862(199810)04:05<183::AID-CVDE183>3.0.CO;2-M3.0.CO;2-M>Google Scholar
8 Schulmeister, K., Lunney, J.G. and Bucley, B., J. Appl. Phys. 72, 3480 (1992).10.1063/1.351424Google Scholar
9 Ogrin, F.Y., PhD thesis, Keele University (1996).Google Scholar
10 Takanashi, K., Kurokawa, H. and Fujimori, H., J. Appl. Phys. 63, 1585 (1993).Google Scholar
11 Gao, C. and O'Shea, M.J., J. Magn. Magn. Mater. 127, 181 (1993).10.1016/0304-8853(93)90213-LGoogle Scholar
12 Poulopoulos, P., Flevaris, N.K., Krishnan, R. and Porte, M., J. Appl. Phys. 75, 4109 (1994).10.1063/1.355990Google Scholar
13 Aharoni, A., J. Appl. Phys. 76, 6977 (1994).10.1063/1.358061Google Scholar