Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2024-12-27T02:12:51.660Z Has data issue: false hasContentIssue false

Submicrometer scale growth morphology control for the making of photonic crystal structures

Published online by Cambridge University Press:  01 February 2011

E. Gil-Lafon
Affiliation:
LASMEA UMR CNRS 6602, Université Blaise Pascal, Campus Universitaire des Cézeaux, 63177 Aubière Cedex, France
A. Trassoudaine
Affiliation:
LASMEA UMR CNRS 6602, Université Blaise Pascal, Campus Universitaire des Cézeaux, 63177 Aubière Cedex, France
D. Castelluci
Affiliation:
LASMEA UMR CNRS 6602, Université Blaise Pascal, Campus Universitaire des Cézeaux, 63177 Aubière Cedex, France
A. Pimpinelli
Affiliation:
LASMEA UMR CNRS 6602, Université Blaise Pascal, Campus Universitaire des Cézeaux, 63177 Aubière Cedex, France
R. Saoudi
Affiliation:
LTSI UMR CNRS 5516, 23 rue du Docteur Paul Michelon, 42023 Saint-Etienne Cedex 02, France
O. Parriaux
Affiliation:
LTSI UMR CNRS 5516, 23 rue du Docteur Paul Michelon, 42023 Saint-Etienne Cedex 02, France
A. Muravaud
Affiliation:
LTSI UMR CNRS 5516, 23 rue du Docteur Paul Michelon, 42023 Saint-Etienne Cedex 02, France
C. Darraud
Affiliation:
IRCOM UMR CNRS 6615, Université de Limoges, 123 avenue A. Thomas, 87060 Limoges Cedex, France
Get access

Abstract

The feasibility of micrometer scale dielectric periodic structures by using a single selective hydride vapour phase epitaxy (HVPE) step was assessed. HVPE is a near-equilibrium growth process which offers perfect selectivity whatever the pattern design, thus giving rise to a great flexibility. The HVPE growth is also mainly governed by the intrinsic anisotropy of the surface kinetics of the crystal. We demonstrate here that micrometer scale dielectric periodic structures, constituted of perfectly defined 1μm wide GaAs beams alternately stacked with air, can be grown by selective HVPE by controlling the hierarchy of the growth rates of the low index faces of the III-V crystal via the growth temperature and the composition of the vapour phase. Potential of the HVPE growth technic for the making of submicrometer scale structures is finally discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Yablonovitch, E., Phys. Rev. Lett. 58, 20592062 (1987).Google Scholar
2. Todaro, M.T., Stomeo, T., Vitale, V., DeVittorio, M., Passaseo, A., Cingolani, R., Ro manato, F., Businaro, L. and Di, E.Fabrizio, Microelectronic Engineering 67–68, 670675 (2003).Google Scholar
3. François, M., Danglot, J., Grimbert, B., Mounaix, P., Muller, M., Vanbésien, O. and Lippens, D., Microelectronic Engineering 61–62, 537544 (2002).Google Scholar
4. Sudo, S., Yokoyama, Y., Nakazaki, T., Mori, K., Kudo, K., Yamaguchi, M. and Sasaki, T., J. Crystal Growth 221, 189195 (2000).Google Scholar
5. Takeda, J., Akabori, M., Motohisa, J. and Fukui, T., Applied Surface Science 190, 236241 (2002).Google Scholar
6. Gil-Lafon, E., Napierala, J., Castelluci, D., Pimpinelli, A., Cadoret, R., Gérard, B., J. Crystal Growth 222(3), 482496 (2001).Google Scholar
7. Lacour, D., Granet, G., Plumey, J.P. and Mure-Ravaud, A., Optical and Quantum Electronics 33, 451470 (2001).Google Scholar
8. Pimpinelli, A. and Peyla, P., ‘Facet growth and stability during localized epitaxy’, to be published (2004).Google Scholar
9. Gil-Lafon, E., Videcoq, A., Napierala, J., castelluci, D., Pimpinelli, A., Gérard, B., Jimenez, J., Avella, M., Optical Materials 17, 267270 (2001).Google Scholar
10. Gil-Lafon, E., Trassoudaine, A., Saoudi, R., Muravaud, A., Parriaux, O., Darraud, C., to be published (2004).Google Scholar